SCHEMBL413809

SCHEMBL413809

C=Cc1cccc(C(C)(C)C)c1O[SiH](C)C

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALOX12 P18054 1/20 0.36
CA2 P00918 1/20 0.34
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1010833 0.83 CA2 (0.41) ALOX12CA2GABRA1GABRB2ALDH1A1
SCHEMBL15002486 0.81 ALOX12 (0.39) ALOX12CA2GABRA1GABRB2ALDH1A1
SCHEMBL4271982 0.80 ALOX12 (0.36) ALOX12CA2GABRA1GABRB2ALDH1A1
SCHEMBL28376669 0.79 ALOX12 (0.38) ALOX12CA2GABRA1GABRB2ALDH1A1
SCHEMBL5888677 0.77 ALOX12 (0.36) ALOX12CA2GABRA1GABRB2ALDH1A1
SCHEMBL9469270 0.76 ALDH1A1 (0.31) ALDH1A1
SCHEMBL31127743 0.75 ALOX12 (0.35) ALOX12CA2GABRA1GABRB2
SCHEMBL8138383 0.75 GABRA1 (0.47) CA2GABRA1GABRB2ALDH1A1
SCHEMBL9696405 0.74 CA2 (0.38) CA2GABRA1GABRB2ALDH1A1
SCHEMBL2365232 0.74 CA2 (0.38) CA2GABRA1GABRB2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025048577-A1 METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION 주식회사 이엔에프테크놀로지 2025-03-06 WO disclosed
US-12180322-B2 Protein adsorption preventing agent, protein adsorption preventing film, and medical tool using same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2024-12-31 US disclosed
EP-3647389-B1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME MARUZEN PETROCHEM CO LTD (JP) 2023-05-10 EP disclosed
US-20210122867-A1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2021-04-29 US disclosed
EP-3647389-A1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME Maruzen Petrochemical Co., Ltd. (JP) 2020-05-06 EP disclosed
US-9598553-B2 Metal nanoparticle composite and method for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2017-03-21 US disclosed
US-20140058028-A1 METAL NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2014-02-27 US disclosed
EP-2669029-A1 METALLIC NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME Maruzen Petrochemical Co., Ltd. (JP) 2013-12-04 EP disclosed
US-8492483-B2 ABA triblock copolymer and process for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-07-23 US disclosed
US-20120172535-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2012-07-05 US disclosed
EP-2465885-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical Co., Ltd. (JP) 2012-06-20 EP disclosed
EP-2412737-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical CO., LTD. (JP) 2012-02-01 EP disclosed
US-20120022219-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD 2012-01-26 US disclosed
US-20100286351-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-11-11 US disclosed
EP-2186837-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-05-19 EP disclosed
US-7026406-B1 Syndiotactic styrene polymers and process for the production thereof NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2006-04-11 US disclosed
EP-1283221-A1 SYNDIOTACTIC STYRENE POLYMERS AND PROCESS FOR THE PRODUCTION THEREOF National Institute of Advanced Industrial Science and Technology (JP) 2003-02-12 EP disclosed
US-6506537-B2 Photopolymerization JSR CORPORATION (JP) 2003-01-14 US disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed