Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 1.00 |
| ▸ | CYP2C19 | P33261 | 1/20 | 1.00 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | HTR7 | P34969 | 1/20 | 0.43 |
| ▸ | HTR2B | P41595 | 1/20 | 0.43 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.43 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | CFTR | P13569 | 1/20 | 0.39 |
| ▸ | GOPC | Q9HD26 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28470691 | 0.90 | CYP1A2 (0.82) | CYP1A2CYP2C19TAAR1HTR1AHTR7 | |
| SCHEMBL28473016 | 0.83 | CYP1A2 (0.70) | CYP1A2CYP2C19TAAR1HTR1AHTR7 | |
| SCHEMBL28467350 | 0.79 | CYP1A2 (0.65) | CYP1A2CYP2C19TAAR1HTR1AHTR7 | |
| SCHEMBL28475793 | 0.78 | CYP1A2 (0.64) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL416287 | 0.77 | CYP1A2 (0.62) | CYP1A2CYP2C19TAAR1HTR1AHTR7 | |
| SCHEMBL21189670 | 0.77 | CYP1A2 (0.62) | CYP1A2CYP2C19TAAR1NPSR1KMT2A | |
| SCHEMBL18287923 | 0.73 | CYP1A2 (0.57) | CYP1A2CYP2C19TAAR1NPSR1CFTR | |
| SCHEMBL416288 | 0.72 | CYP1A2 (0.57) | CYP1A2CYP2C19TAAR1HTR1AHTR7 | |
| SCHEMBL7179828 | 0.72 | CYP1A2 (0.57) | CYP1A2CYP2C19NPSR1MEN1KMT2A | |
| SCHEMBL414934 | 0.70 | CYP1A2 (0.54) | CYP1A2CYP2C19TAAR1NPSR1CFTR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111804340-B | Method for preparing dibenzoxanthene derivative by catalysis of magnetic mesoporous polymeric ionic liquid | 曲阜师范大学 | 2022-05-27 | — | — | CN | disclosed |
| CN-111804340-A | Method for preparing dibenzoxanthene derivative by catalysis of magnetic mesoporous polymeric ionic liquid | 曲阜师范大学 | 2020-10-23 | — | — | CN | disclosed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8795955-B2 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795955-B2 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20110311920-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2011-12-22 | — | — | US | disclosed |
| US-20110311920-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2011-12-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110311920-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS | SMC1A, VCAM1, APOB | CYP1A2 649/4885CYP2C19 2115/4885TAAR1 1412/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.