SCHEMBL21189670

SCHEMBL21189670

IC1c2c(ccc3ccccc23)Oc2ccc3ccccc3c21

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.62
CYP2C19 P33261 2/20 0.62
TAAR1 Q96RJ0 1/20 0.45
NPSR1 Q6W5P4 4/20 0.44
CFTR P13569 1/20 0.43
GOPC Q9HD26 1/20 0.43
HSD17B10 Q99714 2/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP2A6 P11509 1/20 0.42
TSHR P16473 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
GAA P10253 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
KDM4E B2RXH2 1/20 0.40
GLA P06280 1/20 0.40
CYP2C9 P11712 1/20 0.40
HPGD P15428 1/20 0.40
SIRT1 Q96EB6 1/20 0.40
HPRT1 P00492 1/20 0.39
NPC1 O15118 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL416287 0.80 CYP1A2 (0.62) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL18287923 0.80 CYP1A2 (0.57) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL414934 0.77 CYP1A2 (0.54) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL415460 0.77 NPSR1 (0.68) CYP1A2CYP2C19NPSR1CFTRGOPC
SCHEMBL414943 0.77 CYP1A2 (1.00) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL416288 0.76 CYP1A2 (0.57) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL416279 0.76 CYP1A2 (0.53) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL18287902 0.73 MAOA (0.58) CYP1A2CYP2C19TAAR1NPSR1CFTR
SCHEMBL414309 0.73 NPSR1 (0.52) CYP1A2CYP2C19NPSR1CFTRGOPC
SCHEMBL24224558 0.72 NPSR1 (0.58) CYP1A2CYP2C19NPSR1CFTRGOPC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed