Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO2 | P16083 | 1/20 | 0.46 |
| ▸ | DYRK1A | Q13627 | 2/20 | 0.42 |
| ▸ | CTNNB1 | P35222 | 4/20 | 0.41 |
| ▸ | WNT3A | P56704 | 4/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | PI4KA | P42356 | 1/20 | 0.35 |
| ▸ | PI4K2B | Q8TCG2 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1156058 | 0.96 | NQO2 (0.50) | NQO2DYRK1ACTNNB1WNT3ANPC1 | |
| SCHEMBL24155753 | 0.79 | CYP2A6 (0.41) | DYRK1ANPC1RAB9ASMN1; SMN2ALDH1A1 | |
| SCHEMBL11781360 | 0.79 | CYP2A6 (0.41) | DYRK1ACTNNB1WNT3ANPC1RAB9A | |
| Benzo[D]Oxazole SCHEMBL29250371 | 0.78 | ALDH1A1 (0.44) | NQO2DYRK1ANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL9375884 | 0.77 | NPC1 (0.46) | DYRK1ANPC1RAB9ASMN1; SMN2ALDH1A1 | |
| SCHEMBL29521347 | 0.76 | DYRK1A (0.47) | DYRK1AALDH1A1MAPTCHRNB2CHRNA4 | |
| SCHEMBL941915 | 0.75 | CHRNB2 (0.48) | DYRK1ACTNNB1WNT3ANPC1RAB9A | |
| SCHEMBL6119475 | 0.73 | CHRNB2 (0.47) | DYRK1ACTNNB1WNT3ANPC1RAB9A | |
| Naphthalene SCHEMBL4374240 | 0.72 | MAPT (0.43) | NQO2DYRK1ACTNNB1WNT3ANPC1 | |
| Naphthalene SCHEMBL1068711 | 0.72 | MAPT (0.43) | NQO2DYRK1ACTNNB1WNT3ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021014023-A1 | ORGANIC ELECTROLUMINESCENT DEVICE EMITTING GREEN LIGHT | CYNORA GMBH (DE) | 2021-01-28 | — | — | WO | disclosed |
| US-20090092766-A1 | GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-04-09 | — | — | US | disclosed |
| US-7183010-B2 | Organic light-emitting diode devices with improved operational stability | EASTMAN KODAK CORPORATION (US) | 2007-02-27 | — | — | US | disclosed |
| WO-2006123834-A2 | GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2006-11-23 | — | — | WO | disclosed |
| EP-1061411-B1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO LTD (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1067430-B1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO LTD (JP) | 2006-09-13 | — | — | EP | disclosed |
| US-20050271987-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-08 | — | — | US | disclosed |
| US-6838231-B2 | Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040166450-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. | 2004-08-26 | — | — | US | disclosed |
| US-6780577-B2 | A MULTILAYER COMPRISING PHOTOSENSITIVE DYES WITH ABSORPTION SPECTRA AT A HIGH FLUORESCENCE WAVELENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-24 | — | — | US | disclosed |
| US-20030180673-A1 | Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2003-09-25 | — | — | US | disclosed |
| US-20030170575-A1 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| US-6610466-B2 | Exhibits increased light absorption and light absorption intensity and which has sensitizing dyes adsorbed in multilayer form stably even in the presence of an organic solvent. | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-26 | — | — | US | disclosed |
| US-6582894-B1 | Silver haide photographic emulsion and photographic light-sensitive material using same | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-24 | — | — | US | disclosed |
| US-6521401-B1 | Spectrally sensitizing with dye that does not have electric charge or forms an inner salt | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-18 | — | — | US | disclosed |
| US-20020177087-A1 | Silver halide photographic lightsensitive material | FUJIFILM CORPORATION (JP) | 2002-11-28 | — | — | US | disclosed |
| US-6465166-B1 | HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING | FUJI PHOTO FILM. CO., LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| US-20020012892-A1 | Methine compound-containing silver halide photographic emulsion and photographic material using the same | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1067430-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2001-01-10 | — | — | EP | disclosed |
| EP-1061411-A1 | Silver halide photographic emulsion and photographic light-sensitive material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-20 | — | — | EP | disclosed |