SCHEMBL415571

SCHEMBL415571

C[Si](C)(Cc1ccc(N)cc1)O[Si](C)(C)Cc1ccc(N)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.44
CYP3A4 P08684 4/20 0.44
TSHR P16473 3/20 0.44
GFER P55789 3/20 0.44
ALDH1A1 P00352 3/20 0.44
LOXL2 Q9Y4K0 1/20 0.42
CYP19A1 P11511 4/20 0.38
MAPT P10636 3/20 0.38
LMNA P02545 1/20 0.38
MAOA P21397 2/20 0.38
MAOB P27338 2/20 0.38
MAPK1 P28482 3/20 0.37
ESR1 P03372 1/20 0.37
PSMD14 O00487 1/20 0.37
RECQL P46063 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
CYP17A1 P05093 1/20 0.36
CYP11B1 P15538 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10249515 0.79 AGXT (0.43) TDP1ALDH1A1CYP19A1ESR1CYP11B1
SCHEMBL26185016 0.78 GFER (0.52) TDP1CYP3A4TSHRGFERALDH1A1
SCHEMBL2007156 0.78 ESR1 (0.58) TDP1CYP3A4TSHRGFERALDH1A1
SCHEMBL29555286 0.78 CYP3A4 (0.50) TDP1CYP3A4TSHRGFERALDH1A1
SCHEMBL8954012 0.78 MAPT (0.41) TDP1CYP3A4TSHRGFERALDH1A1
SCHEMBL6580864 0.77 ESR1 (0.64) CYP3A4ALDH1A1LMNAESR1L3MBTL1
SCHEMBL5388447 0.76 TSHR (0.42) TSHRALDH1A1LOXL2LMNATP53
SCHEMBL9615514 0.76 IDO1 (0.50) CYP3A4TSHRALDH1A1MAPTMAOB
SCHEMBL15981416 0.74 CYP3A4 (0.46) TDP1CYP3A4TSHRGFERALDH1A1
SCHEMBL3110044 0.73 TDP1 (0.44) TDP1CYP3A4TSHRGFERALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8349537-B2 Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof PI R&D CO., LTD. (JP) 2013-01-08 US disclosed
US-20120065310-A1 COMPOSITION, COATED FILM FORMED OF THE COMPOSITION, LAYERED PRODUCT CONTAINING THE COATED FILM, AND ELECTRONIC DEVICE INCORPORATING THE LAYERED PRODUCT ADACHI HIROAKI (JP) 2012-03-15 US disclosed
US-20110127077-A1 BLOCK COPOLYMERIZED POLYIMIDE INK COMPOSITION FOR PRINTING WIN MAW SOE 2011-06-02 US disclosed
US-20110111351-A1 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof WIN MAW SOE 2011-05-12 US disclosed
US-20100167022-A1 COMPOSITION, COATED FILM FORMED OF THE COMPOSITION, LAYERED PRODUCT CONTAINING THE COATED FILM, AND ELECTRONIC DEVICE INCORPORATING THE LAYERED PRODUCT ASAHI KASEI KABUSHIKI KAISHA (JP) 2010-07-01 US disclosed
US-20090229870-A1 BLOCK COPOLYMERIZED POLYIMIDE INK COMPOSITION FOR PRINTING WIN MAW SOE 2009-09-17 US disclosed
US-20090186295-A1 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof PI R&D CO., LTD. (JP) 2009-07-23 US disclosed
US-20080275181-A1 Having siloxane functionality; continuous printing properties; low temperature dryability; printed circuit board protective films; dimensional stability, flexibility, adhesiveness; heat and chemical resistance SUMITOMO ELECTRIC INDUSTRIES, LTD (JP) 2008-11-06 US disclosed