SCHEMBL6580864

SCHEMBL6580864

C[Si](C)(Cc1ccc(O)cc1)O[Si](C)(C)Cc1ccc(O)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.64
ESR2 Q92731 5/20 0.44
IDO1 P14902 2/20 0.43
ABAT P80404 1/20 0.41
CALM1 P0DP23 1/20 0.39
CA2 P00918 1/20 0.39
SLC6A2 P23975 4/20 0.39
TAAR1 Q96RJ0 3/20 0.39
TMEM97 Q5BJF2 1/20 0.39
SIGMAR1 Q99720 1/20 0.39
ADRA2A P08913 3/20 0.38
KDM4E B2RXH2 2/20 0.38
ALDH1A1 P00352 2/20 0.38
HTR1A P08908 1/20 0.38
CYP2C19 P33261 1/20 0.38
HTR3A P46098 1/20 0.38
BACE1 P56817 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
ADORA3 P0DMS8 2/20 0.38
TACR2 P21452 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683739 0.80 ESR1 (0.61) ESR1ESR2IDO1ABATCALM1
SCHEMBL10249515 0.79 AGXT (0.43) ESR1IDO1CA2TAAR1ALDH1A1
SCHEMBL10249565 0.78 ESR1 (0.52) ESR1ESR2IDO1CALM1CA2
SCHEMBL10712863 0.78 ESR1 (1.00) ESR1ESR2IDO1ABATCA2
SCHEMBL14340166 0.77 ESR1 (0.57) ESR1ESR2IDO1ABATCALM1
SCHEMBL5388447 0.76 TSHR (0.42) IDO1CALM1TAAR1ADRA2AALDH1A1
SCHEMBL9615514 0.76 IDO1 (0.50) IDO1CALM1CA2TAAR1KDM4E
SCHEMBL8999888 0.75 CALM1 (0.52) ESR1ESR2CALM1CA2SLC6A2
SCHEMBL20199368 0.74 ESR1 (0.54) ESR1ESR2IDO1ABATCALM1
SCHEMBL10124382 0.74 ESR1 (0.57) ESR1ESR2TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5130461-A Silylation 1,3-(p-dimethoxybenzyl)-1,1,3,3-tetramethyl disiloxane with trimethylsilyl iodide followed by desilylation SHIN-ETSU CHEMICAL COMPANY LIMITED (JP) 1992-07-14 US claimed
JP-4041493-A None JP disclosed
US-7901855-B2 Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2011-03-08 US disclosed
US-7875410-B2 capable opersistently exerting effect of mitigating contact stress with contact members and improved potential stability during repeated use; polycarbonates CANON KABUSHIKI KAISHA (JP) 2011-01-25 US disclosed
US-20100092209-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2010-04-15 US disclosed
US-20100092208-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2010-04-15 US disclosed
EP-1144532-B1 ADHESIVE COMPOSITIONS AND ADHESIVE SHEETS MINNESOTA MINING & MFG (US) 2004-05-06 EP disclosed
US-6627688-B1 Adhesive compositions and adhesive sheets 3M INNOVATIVE PROPERTIES COMPANY 2003-09-30 US disclosed
EP-1131212-B1 DECORATIVE FILM AND METHOD FOR THE PRODUCTION OF THE SAME MINNESOTA MINING & MFG (US) 2003-05-02 EP disclosed
US-6383613-B1 Decorative film and method for the production of the same 3M INNOVATIVE PROPERTIES COMPANY 2002-05-07 US disclosed
EP-1144532-A1 ADHESIVE COMPOSITIONS AND ADHESIVE SHEETS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2001-10-17 EP disclosed
EP-1131212-A1 DECORATIVE FILM AND METHOD FOR THE PRODUCTION OF THE SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2001-09-12 EP disclosed
WO-2000034405-A1 ADHESIVE COMPOSITIONS AND ADHESIVE SHEETS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2000-06-15 WO disclosed
WO-2000023287-A1 DECORATIVE FILM AND METHOD FOR THE PRODUCTION OF THE SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2000-04-27 WO disclosed
US-5130461-A Silylation 1,3-(p-dimethoxybenzyl)-1,1,3,3-tetramethyl disiloxane with trimethylsilyl iodide followed by desilylation SHIN-ETSU CHEMICAL COMPANY LIMITED (JP) 1992-07-14 US disclosed
US-5130461-A Silylation 1,3-(p-dimethoxybenzyl)-1,1,3,3-tetramethyl disiloxane with trimethylsilyl iodide followed by desilylation SHIN-ETSU CHEMICAL COMPANY LIMITED (JP) 1992-07-14 US disclosed
US-5130461-A Silylation 1,3-(p-dimethoxybenzyl)-1,1,3,3-tetramethyl disiloxane with trimethylsilyl iodide followed by desilylation SHIN-ETSU CHEMICAL COMPANY LIMITED (JP) 1992-07-14 US disclosed
JP-H0441493-A 1,3-BIS(P-HYDROXYBENZYL)-1,1,3,3-TETRAMETHYL-DISILOXANE AND PRODUCTION THEREOF SHIN ETSU CHEM CO LTD 1992-02-12 JP disclosed