SCHEMBL4158265

SCHEMBL4158265

CC(C)(O)c1cc(Br)cc(C(C)(C)O)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.37
TSHR P16473 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
ALDH1A1 P00352 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
ALOX12 P18054 1/20 0.37
CASP1 P29466 1/20 0.37
RECQL P46063 1/20 0.37
HIF1A Q16665 1/20 0.37
HSD17B10 Q99714 1/20 0.37
GABRA1 P14867 2/20 0.36
GABRB2 P47870 1/20 0.36
NOTUM Q6P988 1/20 0.34
GABRB1 P18505 1/20 0.32
CHEK1 O14757 1/20 0.31
DAPK3 O43293 1/20 0.31
RET P07949 1/20 0.31
PDGFRB P09619 1/20 0.31
PIM1 P11309 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15455484 0.94 CYP3A4 (0.37) CYP3A4TSHRTDP1ALDH1A1HPGD
SCHEMBL13278178 0.93 GABRA1 (0.48) CYP3A4TSHRTDP1ALDH1A1HPGD
SCHEMBL14994029 0.89 NOTUM (0.49) NOTUMKDR
SCHEMBL548187 0.85 GABRA1 (0.45) CYP3A4TSHRTDP1ALDH1A1HPGD
SCHEMBL31075912 0.84 NOTUM (0.33) CYP3A4TSHRTDP1ALDH1A1HPGD
SCHEMBL20569873 0.84 MEN1 (0.37) CYP3A4TSHRTDP1ALDH1A1HPGD
SCHEMBL309871 0.82 CA1 (0.41) CYP3A4ALDH1A1HSD17B10NOTUM
SCHEMBL15456773 0.79 ALDH1A1 (0.39) ALDH1A1NOTUM
SCHEMBL3072277 0.79 NOTUM (0.45) CYP3A4TDP1ALDH1A1HPGDALOX15
SCHEMBL18802839 0.77 ALOX15 (0.46) CYP3A4TSHRTDP1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113727970-B Maleimide, curable resin composition, and cured product DIC株式会社 2024-11-15 CN disclosed
CN-113767130-B Curable resin composition DIC株式会社 2024-09-20 CN disclosed
CN-113748149-B Curable resin composition DIC株式会社 2024-05-24 CN disclosed
CN-113767117-B Curable resin composition DIC株式会社 2023-08-15 CN disclosed
CN-113748152-B Curable resin composition DIC株式会社 2023-08-15 CN disclosed
CN-113728030-B Curable resin composition DIC株式会社 2023-08-15 CN disclosed
US-20230159695-A1 CURABLE RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT DIC CORPORATION (JP) 2023-05-25 US disclosed
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-10 US disclosed
CN-110526802-B Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming method 信越化学工业株式会社 2022-09-20 CN disclosed
EP-3572876-B1 MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2021-04-14 EP disclosed
CN-101421252-B 2, 6-substituted-4-monosubstituted aminopyrimidines as prostaglandin D2 receptor antagonists SANOFI AVENTIS 2011-10-12 CN disclosed
CN-101421252-A 2, 6-substituted-4-monosubstituted aminopyrimidines as prostaglandin D2 receptor antagonists SANOFI AVENTIS (FR) 2009-04-29 CN disclosed
US-20090036469-A1 2,6-SUBSTITUTED-4-MONOSUBSTITUTED AMINO-PYRIMIDINE AS PROSTAGLANDIN D2 RECEPTOR ANTAGONISTS SANOFI-AVENTIS (FR) 2009-02-05 US disclosed
WO-2008039882-A1 A COMBINATION OF NIACIN AND A PROSTAGLANDIN D2 RECEPTOR ANTAGONIST SANOFI-AVENTIS U.S. LLC (US) 2008-04-03 WO disclosed
US-7005216-B2 Photo mask RENESAS TECHNOLOGY CORP. (JP) 2006-02-28 US disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
US-20030129505-A1 Krypton fluoride laser lithography; photoresist pattern RENESAS ELECTRONICS CORPORATION (JP) 2003-07-10 US disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed
US-5399715-A Polyamino oligomers and polymaleimide compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-03-21 US disclosed
EP-0577836-A1 POLYAMINO-OLIGOMER AND POLYMALEIMIDE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-01-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090036469-A1 2,6-SUBSTITUTED-4-MONOSUBSTITUTED AMINO-PYRIMIDINE AS PROSTAGLANDIN D2 RECEPTOR ANTAGONISTS PTGDR2, PTGDR, PTGER2 CYP3A4 447/4885TSHR 1315/4885TDP1 2484/4885
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process PARG, PCNA, PLK2 CYP3A4 3643/4885TSHR 4309/4885TDP1 2907/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.