SCHEMBL416530

SCHEMBL416530

CC(C)(C)Oc1ccc(I)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 12/20 0.42
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
SLC6A3 Q01959 1/20 0.38
KIF11 P52732 1/20 0.37
TRPV1 Q8NER1 1/20 0.37
ACACB O00763 1/20 0.34
RIPK1 Q13546 1/20 0.34
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
MAPT P10636 1/20 0.33
CYP2C19 P33261 1/20 0.33
PPARA Q07869 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26746 0.86 SLC6A2 (0.44) CA1CA2CA9SLC6A2SLC6A4
Trifluoromethanesulfonic Acid SCHEMBL2878800 0.81 TRPV1 (0.41) APPCA1CA2CA9KIF11
SCHEMBL9210308 0.80 APP (0.40) APPCA1CA2CA9TRPV1
SCHEMBL19339945 0.78 MAPT (0.44) SLC6A2SLC6A4SLC6A3KIF11ACACB
SCHEMBL198046 0.78 RIPK1 (0.43) CA1CA2CA9SLC6A2SLC6A4
SCHEMBL18866585 0.78 MAPT (0.44) SLC6A2SLC6A4SLC6A3KIF11ACACB
SCHEMBL11170231 0.77 SLC6A2 (0.37) SLC6A2SLC6A4SLC6A3KIF11ACACB
SCHEMBL317934 0.76 ACHE (0.50) CA1CA2CA9SLC6A2SLC6A4
SCHEMBL5285766 0.76 CA1 (0.61) CA1CA2CA9MEN1KMT2A
SCHEMBL18260863 0.75 APP (0.41) APPCA1CA2CA9TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN disclosed
US-20240287138-A1 CYCLIC PEPTIDES FOR INHIBITING TNF RECEPTOR 1 ACTIVITY MERCK SHARP & DOHME LLC 2024-08-29 US disclosed
CN-117164438-A Preparation method of styrene resin monomer used as 248nm photoresist raw material 河北凯诺中星科技有限公司 2023-12-05 CN disclosed
CN-116621680-A Synthetic method of styrene resin monomer suitable for 248nm photoresist raw material 河北凯诺中星科技有限公司 2023-08-22 CN disclosed
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-108459469-B Pattern forming method 信越化学工业株式会社 2022-11-11 CN disclosed
CN-115113482-A Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-09-27 CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed
CN-108884114-B Electron-accepting compound, composition for charge transport film, and light-emitting element using same 三菱化学株式会社 2022-02-25 CN disclosed
US-7087766-B2 Reagents for the quantitation of active oxygen DAIICHI PURE CHEMICALS CO., LTD. (JP) 2006-08-08 US disclosed
CN-1607461-A Resist polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2005-04-20 CN disclosed
CN-1578794-A Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity DUPONT ELECTRONIC TECHNOLOGIES (US) 2005-02-09 CN disclosed
CN-1182128-C Reagents for the quantitation active oxygen ��һ��ѧҩƷ��ʽ���� 2004-12-29 CN disclosed
CN-1550896-A Processes for preparing photoresist compositions and the product ��Ļ���Ű˾ 2004-12-01 CN disclosed
US-20030158419-A1 Method for producing biaryl compound SUMITOMO CHEMICAL COMPANY, LIMITED 2003-08-21 US disclosed
US-20030153027-A1 Reagents for the quantitation of active oxygen SEKISUI MEDICAL CO., LTD. (JP) 2003-08-14 US disclosed
EP-1312605-A1 Method for producing biaryl compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-05-21 EP disclosed
CN-1418208-A Reagent for measuring active oxygen DAIICHI PURE CHEMICALS CO LTD (JP) 2003-05-14 CN disclosed
EP-1260508-A1 REAGENTS FOR THE QUANTITATION OF ACTIVE OXYGEN DAIICHI PURE CHEMICALS CO., LTD. (JP) 2002-11-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240287138-A1 CYCLIC PEPTIDES FOR INHIBITING TNF RECEPTOR 1 ACTIVITY TNF, TNFRSF1A, CD40 APP 567/4885CA1 4485/4885CA2 4832/4885
US-20030158419-A1 Method for producing biaryl compound B2M, BMI1, CYP2W1 APP 3965/4885CA1 1473/4885CA2 872/4885
US-20030153027-A1 Reagents for the quantitation of active oxygen CBR1, LPO, CBR3 APP 4719/4885CA1 524/4885CA2 137/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.