Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.30 |
| ▸ | LCK | P06239 | 1/20 | 0.30 |
| ▸ | FYN | P06241 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL131439 | 0.89 | TDP1 (0.38) | TDP1CYP2C9ALDH1A1EPHX2HSD11B1 | |
| Adamantane SCHEMBL22115918 | 0.89 | TDP1 (0.38) | TDP1CYP2C9ALDH1A1EPHX2HSD11B1 | |
| Adamantane SCHEMBL21924976 | 0.89 | TDP1 (0.38) | TDP1CYP2C9ALDH1A1EPHX2HSD11B1 | |
| SCHEMBL27712181 | 0.83 | HSD11B1 (0.32) | HSD11B1 | |
| Acetic Acid SCHEMBL14244268 | 0.83 | FFAR3 (0.47) | TDP1CYP2C9CYP2C19EPHX2HSD11B1 | |
| Methacrylic Acid SCHEMBL2833953 | 0.79 | TDP1 (0.35) | TDP1ALDH1A1HSD11B1FFAR3LCK | |
| Methacrylic Acid SCHEMBL479571 | 0.79 | TDP1 (0.35) | TDP1ALDH1A1HSD11B1FFAR3LCK | |
| Methacrylic Acid SCHEMBL29009377 | 0.76 | — | — | |
| Bicarbonate SCHEMBL27895499 | 0.76 | CA1 (0.39) | TDP1CYP2C9CYP2C19HSD11B1 | |
| Bicarbonate SCHEMBL27573917 | 0.76 | CA1 (0.39) | TDP1CYP2C9CYP2C19HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105694385-A | Master batch capable of enhancing properties and melt strength of condensation polymer and preparation method thereof | 上海富元塑胶科技有限公司 | 2016-06-22 | — | — | CN | claimed |
| CN-105693915-A | Reactive extrusion co-polymerization method for vinyl monomers | 华东理工大学 | 2016-06-22 | — | — | CN | claimed |
| CN-105647399-A | Ultralow-water-absorptivity UV-curing laminated adhesive | 北京天山新材料技术有限公司 | 2016-06-08 | — | — | CN | claimed |
| CN-105143978-A | Photosensitive resin composition, method for forming pattern, and liquid crystal display device using same | DONGJIN SEMICHEM CO LTD | 2015-12-09 | — | — | CN | claimed |
| CN-105103050-A | Method for producing substrate having pattern and resin composition for hydrofluoric acid etching | NISSAN CHEMICAL IND LTD | 2015-11-25 | — | — | CN | claimed |
| CN-105017485-A | Adamantyl-containing hydrophobic association zwitter-ion xanthan gum and preparation method thereof | CHINA PETROLEUM & CHEMICAL | 2015-11-04 | — | — | CN | claimed |
| CN-104874031-A | Polyurethane derivative for simulating human fibrinolytic system and vascular endothelial system, preparation method and preparation method of related product | UNIV SOOCHOW | 2015-09-02 | — | — | CN | claimed |
| CN-103242496-B | Multi-layer microcapsule for room-temperature self repairing, and preparation method and application thereof | UNIV SUN YAT SEN | 2015-07-22 | — | — | CN | claimed |
| CN-103146105-B | Reaction extrusion polymerization method of functional acrylate resin | UNIV EAST CHINA SCIENCE & TECH | 2015-04-29 | — | — | CN | claimed |
| CN-102890347-B | Liquid crystal display device including side supporting means and method of fabricating the same | LG DISPLAY CO LTD | 2015-03-04 | — | — | CN | claimed |
| CN-101059653-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-10-24 | — | — | CN | claimed |
| CN-101051186-A | Negative photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-10-10 | — | — | CN | claimed |
| CN-101000462-A | Photocurable resin composition and method for forming pattern | HITACHI CHEMICAL CO LTD (JP) | 2007-07-18 | — | — | CN | claimed |
| EP-1671184-A4 | PHOTORESIST COMPOSITIONS COMPRISING DIAMONDOID DERIVATIVES | CHEVRON USA INC (US) | 2007-01-03 | — | — | EP | claimed |
| CN-1885163-A | Negative resist composition | ADMS TECHNOLOGY CO LTD (KR) | 2006-12-27 | — | — | CN | claimed |
| EP-1671184-A2 | PHOTORESIST COMPOSITIONS COMPRISING DIAMONDOID DERIVATIVES | Chevron U.S.A. Inc. (US) | 2006-06-21 | — | — | EP | claimed |
| WO-2005036265-A2 | PHOTORESIST COMPOSITIONS COMPRISING DIAMONDOID DERIVATIVES | CHEVRON U.S.A. INC. (US) | 2005-04-21 | — | — | WO | claimed |
| US-20050074690-A1 | Photoresist compositions comprising diamondoid derivatives | CHEVRON U.S.A. INC. | 2005-04-07 | — | — | US | claimed |
| CN-1212721-A | Radiation Curable Coatings | BASF AG (DE) | 1999-03-31 | — | — | CN | claimed |
| CN-1209084-A | Method for coating articles with radiation-curable powder coatings | BASF LACKE & FARBEN (DE) | 1999-02-24 | — | — | CN | claimed |