Methacrylic Acid

Methacrylic Acid

SCHEMBL479571

C1CC2CCC1C2.C1CC2CCC1C2.C=C(C)C(=O)O

nearest known ligand 0.35

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.35
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31
HSD11B1 P28845 1/20 0.30
FFAR3 O14843 1/20 0.30
LCK P06239 1/20 0.30
FYN P06241 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL2833953 1.00 TDP1 (0.35) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
Methacrylic Acid SCHEMBL5879020 0.95 LMNA (0.32) TDP1LMNATSHR
Adamantane SCHEMBL21924976 0.89 TDP1 (0.38) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
Adamantane SCHEMBL22115918 0.89 TDP1 (0.38) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
Adamantane SCHEMBL131439 0.89 TDP1 (0.38) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
Acetic Acid SCHEMBL5399148 0.83 FFAR3 (0.47) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
Methacrylic Acid SCHEMBL4167447 0.79 TDP1 (0.35) TDP1ALDH1A1HSD11B1FFAR3LCK
Methacrylic Acid SCHEMBL3288565 0.78 TDP1 (0.38) TDP1ALDH1A1LMNATSHRFFAR3
Methacrylic Acid SCHEMBL21924975 0.77 THRB (0.36) ALDH1A1HSD11B1
Methacrylic Acid SCHEMBL29009377 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8183313-B2 Light guide including surface-treated resin OMRON CORPORATION (JP) 2012-05-22 US disclosed
EP-2082872-B1 LIGHT GUIDE HAVING A SURFACE-TREATED RESIN, AND PRODUCTION METHOD THEREOF OMRON TATEISI ELECTRONICS CO (JP) 2012-02-01 EP disclosed
US-20100304153-A1 SURFACE-TREATED RESIN, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME OMRON CORPORATION (JP) 2010-12-02 US disclosed
EP-2082872-A1 SURFACE-TREATED RESIN, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME OMRON Corporation, a corporation of Japan (JP) 2009-07-29 EP disclosed