Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.30 |
| ▸ | LCK | P06239 | 1/20 | 0.30 |
| ▸ | FYN | P06241 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL479571 | 1.00 | TDP1 (0.35) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| Methacrylic Acid SCHEMBL5879020 | 0.95 | LMNA (0.32) | TDP1LMNATSHR | |
| Adamantane SCHEMBL21924976 | 0.89 | TDP1 (0.38) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| Adamantane SCHEMBL22115918 | 0.89 | TDP1 (0.38) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| Adamantane SCHEMBL131439 | 0.89 | TDP1 (0.38) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| Acetic Acid SCHEMBL5399148 | 0.83 | FFAR3 (0.47) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| Methacrylic Acid SCHEMBL4167447 | 0.79 | TDP1 (0.35) | TDP1ALDH1A1HSD11B1FFAR3LCK | |
| Methacrylic Acid SCHEMBL3288565 | 0.78 | TDP1 (0.38) | TDP1ALDH1A1LMNATSHRFFAR3 | |
| Methacrylic Acid SCHEMBL21924975 | 0.77 | THRB (0.36) | ALDH1A1HSD11B1 | |
| Methacrylic Acid SCHEMBL29009377 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200148795-A1 | STYRENE-FREE COATING COMPOSITIONS FOR PACKAGING ARTICLES SUCH AS FOOD AND BEVERAGE CONTAINERS | SWIMC LLC (US) | 2020-05-14 | — | — | US | claimed |
| CN-106459550-B | Thermosetting composition and method for producing thermosetting resin | 出光兴产株式会社 | 2019-03-12 | — | — | CN | claimed |
| CN-116217451-A | Acetal-based compound, acetal-based prepolymer, acetal-based polymer, and photoresist composition including the same | 三星电子株式会社 | 2023-06-06 | — | — | CN | disclosed |
| US-10968288-B2 | Styrene-free coating compositions for packaging articles such as food and beverage containers | SWIMC LLC (US) | 2021-04-06 | — | — | US | disclosed |
| US-20200148795-A1 | STYRENE-FREE COATING COMPOSITIONS FOR PACKAGING ARTICLES SUCH AS FOOD AND BEVERAGE CONTAINERS | SWIMC LLC (US) | 2020-05-14 | — | — | US | disclosed |
| CN-106459550-B | Thermosetting composition and method for producing thermosetting resin | 出光兴产株式会社 | 2019-03-12 | — | — | CN | disclosed |
| CN-108463773-A | Radiation sensitive resin composition, resist pattern forming method and acid diffusion controlling agent | JSR株式会社 | 2018-08-28 | — | — | CN | disclosed |
| CN-104662123-B | Methods of making compositions including quantum dots, methods, and products | 三星电子株式会社 | 2018-06-26 | — | — | CN | disclosed |
| CN-106459550-A | Thermosetting composition and method for producing thermosetting resin | 出光兴产株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-103354830-B | Hot-melt adhesive composition, hot-melt adhesive sheet, and adhesion method | LINTEC CORP. (JP) | 2016-05-11 | — | — | CN | disclosed |
| US-9086531-B2 | Plastic polarized lens, method for producing the same, and polarized film | MITSUI CHEMICALS, INC. (JP) | 2015-07-21 | — | — | US | disclosed |
| CN-101021682-A | Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same | FUJITSU LTD (JP) | 2007-08-22 | — | — | CN | disclosed |
| US-20070040145-A1 | e.g.block copolymer of methoxypolyethylene glycol mono (meth)acrylate with monomers selected from unsaturated ether, alcohol, ester, nitrile, carboxy, anhydride etc.; excellent in thermal properties, physical properties and ion conductivity | NIPPON SODA CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| EP-0942018-B1 | (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO (JP) | 2003-03-12 | — | — | EP | disclosed |
| US-6218485-B1 | LIVING ANIONIC POLYMERIZATION USING AN ORGANIC ALKALI METAL AND/OR AN ALKALI METAL AS A POLYMERIZATION INITIATOR, WHEREIN A TARGET MOLECULAR WEIGHT IS OBTAINED BY ADDING THE COMPOUND DIVIDED INTO MULTIPLE STEPS. | NIPPON SODA CO., LTD. (JP) | 2001-04-17 | — | — | US | disclosed |
| EP-0942018-A1 | (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 1999-09-15 | — | — | EP | disclosed |
| EP-0553801-B1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS (JP) | 1997-04-23 | — | — | EP | disclosed |
| US-5399647-A | Photoresist composition of 1-(1'-cyanoethenyl)adamantane | FUJITSU LIMITED (JP) | 1995-03-21 | — | — | US | disclosed |
| US-5389708-A | Polymerizing polyisocyanate or polyisothiocyanate with polyol or polythiol in presence of thiophosphoric or dithiophosphoric acid ester | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0553801-A1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-08-04 | — | — | EP | disclosed |