Ethylene

Ethylene

SCHEMBL4230874

C=C.C=C.COCCOC(C)=O

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.52
TSHR P16473 2/20 0.52
CHRM5 P08912 2/20 0.46
CHRM1 P11229 2/20 0.46
CHRM3 P20309 2/20 0.46
PGR P06401 1/20 0.46
CHRM2 P08172 1/20 0.46
CHRM4 P08173 1/20 0.46
HTR1A P08908 1/20 0.46
CHRNB2 P17787 1/20 0.46
TBXA2R P21731 1/20 0.46
CHRNB4 P30926 1/20 0.46
CHRNA3 P32297 1/20 0.46
CHRNA7 P36544 1/20 0.46
CHRNA4 P43681 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CHRNA10 Q9GZZ6 1/20 0.46
CHRNA9 Q9UGM1 1/20 0.46
GALR3 O60755 2/20 0.44
GAA P10253 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL996938 1.00 ALDH1A1 (0.52) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL4002515 0.95 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL28307391 0.95 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL24200 0.95
SCHEMBL11060536 0.95 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL4412526 0.92
Acetone SCHEMBL9495889 0.92 ALDH1A1 (0.54) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL5862125 0.92
SCHEMBL29159554 0.92
SCHEMBL4406443 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3028792-B1 NANO-SILVER POWDER, THE PREPARATION THEREOF, METHOD AND APPLICATION IN PREPARATION OF ELECTRICALLY CONDUCTIVE INK AND ELECTRICALLY CONDUCTIVE INK INST CHEMISTRY CAS (CN) 2021-01-13 EP claimed
US-10329445-B2 Method for preparing nano-silver powder and application in preparation of electrically conductive ink of the nano-silver powder and electrically conductive ink INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2019-06-25 US claimed
EP-3028792-A1 NANO-SILVER POWDER, THE PREPARATION METHOD AND APPLICATION IN PREPARATION OF ELECTRICALLY CONDUCTIVE INK OF THE SAME AND ELECTRICALLY CONDUCTIVE INK Institute Of Chemistry, Chinese Academy Of Sciences (CN) 2016-06-08 EP claimed
US-20160152851-A1 Method for Preparing Nano-Silver Powder and Application in Preparation of Electrically Conductive Ink of the Nano-Silver Powder and Electrically Conductive Ink INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2016-06-02 US claimed
EP-3028792-B1 NANO-SILVER POWDER, THE PREPARATION THEREOF, METHOD AND APPLICATION IN PREPARATION OF ELECTRICALLY CONDUCTIVE INK AND ELECTRICALLY CONDUCTIVE INK INST CHEMISTRY CAS (CN) 2021-01-13 EP disclosed
US-10329445-B2 Method for preparing nano-silver powder and application in preparation of electrically conductive ink of the nano-silver powder and electrically conductive ink INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2019-06-25 US disclosed
EP-3028792-A1 NANO-SILVER POWDER, THE PREPARATION METHOD AND APPLICATION IN PREPARATION OF ELECTRICALLY CONDUCTIVE INK OF THE SAME AND ELECTRICALLY CONDUCTIVE INK Institute Of Chemistry, Chinese Academy Of Sciences (CN) 2016-06-08 EP disclosed
US-20160152851-A1 Method for Preparing Nano-Silver Powder and Application in Preparation of Electrically Conductive Ink of the Nano-Silver Powder and Electrically Conductive Ink INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2016-06-02 US disclosed
US-9046769-B2 Pattern-forming method, and composition for forming resist underlayer film JSR CORPORATION (JP) 2015-06-02 US disclosed
US-20140371466-A1 PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2014-12-18 US disclosed
US-8859191-B2 Pattern-forming method, and composition for forming resist underlayer film JSR CORPORATION (JP) 2014-10-14 US disclosed
US-8466229-B2 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2013-06-18 US disclosed
US-20120285929-A1 PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2012-11-15 US disclosed
US-20090110838-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD (JP) 2009-04-30 US disclosed
US-20060047034-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2006-03-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120285929-A1 PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM ADAM9, MUS81, ADAM17 ALDH1A1 4621/4885TSHR 4220/4885CHRM5 2117/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.