Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | ACHE | P22303 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.35 |
| ▸ | PSMB5 | P28074 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CRHBP | P24387 | 1/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL3144004 | 0.98 | CYP1A2 (0.39) | CYP1A2CYP2A6TSHRACHELMNA | |
| Hydrochloric Acid SCHEMBL6764989 | 0.98 | CYP1A2 (0.39) | CYP1A2CYP2A6TSHRACHELMNA | |
| SCHEMBL3183538 | 0.95 | CYP1A2 (0.40) | CYP1A2CYP2A6TSHRACHELMNA | |
| SCHEMBL3136259 | 0.92 | CYP1A2 (0.35) | CYP1A2CYP2A6TSHRACHELMNA | |
| Perchlorate SCHEMBL3132324 | 0.92 | CA12 (0.36) | CYP1A2CYP2A6TSHRACHELMNA | |
| SCHEMBL3126244 | 0.89 | CYP1A2 (0.33) | CYP1A2CYP2A6TSHRACHELMNA | |
| SCHEMBL3139354 | 0.89 | CYP1A2 (0.33) | CYP1A2CYP2A6TSHRACHELMNA | |
| SCHEMBL11903936 | 0.87 | ACHE (0.44) | CYP1A2CYP2A6TSHRACHEFFAR4 | |
| SCHEMBL5066033 | 0.87 | FFAR4 (0.45) | TSHRLMNAALOX12FFAR4MEN1 | |
| SCHEMBL5066003 | 0.87 | FFAR4 (0.41) | LMNAALOX12FFAR4MAPTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 518 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| EP-2856519-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | Merck Patent GmbH (DE) | 2015-04-08 | — | — | EP | claimed |
| WO-2013182265-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | MERCK PATENT GMBH (DE) | 2013-12-12 | — | — | WO | claimed |
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| EP-2102156-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| WO-2008068610-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | claimed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | claimed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | claimed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-20260035592-A1 | CATIONICALLY POLYMERIZABLE RESIN COMPOSITION FOR THREE-DIMENSIONAL PHOTOFABRICATION AND METHOD FOR PRODUCING THREE-DIMENSIONAL PHOTOFABRICATED PRODUCT | TOKUYAMA DENTAL CORPORATION (JP) | 2026-02-05 | — | — | US | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-4222219-B1 | CURABLE SILICONE COMPOSITION AND CURED PRODUCT THEREOF | DOW SILICONES CORP (US) | 2025-11-05 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| CN-1263612-A | Chemically amplified resist composition | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| EP-1024406-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 2000-08-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | C5, CFL1, C9 | CYP1A2 3178/4885CYP2A6 3766/4885TSHR 967/4885 |
| US-20260035592-A1 | CATIONICALLY POLYMERIZABLE RESIN COMPOSITION FOR THREE-DIMENSIONAL PHOTOFABRICATION AND METHOD FOR PRODUCING THREE-DIMENSIONAL PHOTOFABRICATED PRODUCT | TERB1, CAD, C9 | CYP1A2 2760/4885CYP2A6 3042/4885TSHR 2090/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.