Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR4 | Q5NUL3 | 5/20 | 0.41 |
| ▸ | RAPGEF4 | Q8WZA2 | 5/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | METAP2 | P50579 | 1/20 | 0.35 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | GFER | P55789 | 1/20 | 0.33 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL58785 | 0.90 | FFAR4 (0.46) | FFAR4RAPGEF4L3MBTL1LMNATDP1 | |
| SCHEMBL5066033 | 0.90 | FFAR4 (0.45) | FFAR4L3MBTL1LMNATDP1SMN1; SMN2 | |
| SCHEMBL2512387 | 0.89 | RAPGEF4 (0.45) | FFAR4RAPGEF4L3MBTL1LMNATDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL546940 | 0.87 | GPR3 (0.43) | FFAR4RAPGEF4L3MBTL1LMNASMN1; SMN2 | |
| SCHEMBL424812 | 0.87 | CYP1A2 (0.40) | FFAR4RAPGEF4L3MBTL1LMNAMAPT | |
| SCHEMBL2512390 | 0.86 | FFAR4 (0.36) | FFAR4RAPGEF4L3MBTL1LMNATDP1 | |
| Hydrochloric Acid SCHEMBL6764989 | 0.85 | CYP1A2 (0.39) | FFAR4RAPGEF4L3MBTL1LMNAMAPT | |
| Bromide SCHEMBL3144004 | 0.85 | CYP1A2 (0.39) | FFAR4RAPGEF4L3MBTL1LMNAMAPT | |
| SCHEMBL3190654 | 0.85 | FFAR4 (0.47) | FFAR4LMNATDP1SMN1; SMN2 | |
| SCHEMBL6282642 | 0.85 | FFAR4 (0.47) | FFAR4L3MBTL1LMNATDP1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1516230-B1 | PHOTOSENSITIVE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-12-30 | — | — | EP | disclosed |
| EP-1516230-A4 | PHOTOSENSITIVE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-01-02 | — | — | EP | disclosed |
| US-6911297-B2 | Photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-06-28 | — | — | US | disclosed |
| EP-1299774-A4 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPEC CHEM INC (US) | 2005-06-08 | — | — | EP | disclosed |
| EP-1516230-A2 | PHOTOSENSITIVE COMPOSITIONS | Arch Specialty Chemicals, Inc. (US) | 2005-03-23 | — | — | EP | disclosed |
| US-6855476-B2 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-02-15 | — | — | US | disclosed |
| US-20040072095-A1 | Photoresist compositions | ARCH SPECIALITY CHEMICAL, INC. | 2004-04-15 | — | — | US | disclosed |
| WO-2004002955-A2 | PHOTOSENSITIVE COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-01-08 | — | — | WO | disclosed |
| EP-1299774-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |