Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.59 |
| ▸ | LMNA | P02545 | 3/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.56 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.53 |
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.48 |
| ▸ | KDM1A | O60341 | 2/20 | 0.48 |
| ▸ | MAOA | P21397 | 2/20 | 0.48 |
| ▸ | MAOB | P27338 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | CES2 | O00748 | 1/20 | 0.47 |
| ▸ | CES1 | P23141 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29601516 | 0.94 | TSHR (0.67) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL143162 | 0.94 | TSHR (0.67) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL8825063 | 0.93 | TSHR (0.52) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| Bromide SCHEMBL31058252 | 0.92 | TSHR (0.64) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL31145718 | 0.92 | TSHR (0.64) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL31058260 | 0.91 | TSHR (0.57) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| Sulfuric Acid SCHEMBL4556409 | 0.90 | LMNA (0.48) | TSHRLMNAALDH1A1NFE2L2TP53 | |
| SCHEMBL31058126 | 0.87 | TSHR (0.57) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL29457303 | 0.87 | TSHR (0.57) | TSHRLMNAALDH1A1NFE2L2ACHE | |
| SCHEMBL8331595 | 0.87 | TSHR (0.57) | TSHRLMNAALDH1A1NFE2L2ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024158026-A1 | PHOTOSENSITIVE COMPOSITION FOR FORMING HOLOGRAM LAYER | 大日本印刷株式会社 | 2024-08-02 | — | — | WO | disclosed |
| US-20230309369-A1 | Organic Light-Emitting Device | LG CHEM, LTD. (KR) | 2023-09-28 | — | — | US | disclosed |
| US-11737300-B2 | Coating composition and organic light-emitting device | LG CHEM, LTD. (KR) | 2023-08-22 | — | — | US | disclosed |
| US-11702550-B2 | Coating composition, organic light-emitting diode using same, and method for preparing same | LG CHEM, LTD. | 2023-07-18 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9188858-B2 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | JSR CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9152044-B2 | — | — | 2015-10-06 | — | — | US | disclosed |
| US-20110014569-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7812105-B2 | Compound, polymer, and radiation-sensitive composition | JSR CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255420-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | JSR CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| US-6084004-A | MIXTURES OF EPOXY COMPOUNDS, DIARYLIODINIUM COMPOUNDS, ALPHA-DICARBONYL COMPOUNDS, AROMATIC AMINES, FILLERS AND ADJUVANTS WHICH POLYMERIZE TO YIELD STRONG TRANSPARENT PLASTICS FOR DENTAL PROSTHETICS | ESPE DENTAL AG (DE) | 2000-07-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | TSHR 941/4885LMNA 2641/4885ALDH1A1 2200/4885 |
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | TSHR 890/4885LMNA 1517/4885ALDH1A1 2783/4885 |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | MRE11, RAD51, MRPS22 | TSHR 2355/4885LMNA 2035/4885ALDH1A1 4458/4885 |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | TSHR 1006/4885LMNA 1992/4885ALDH1A1 3298/4885 |
| US-11737300-B2 | Coating composition and organic light-emitting device | CD59, CLTB, EPCAM | TSHR 4358/4885LMNA 1463/4885ALDH1A1 2135/4885 |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | TSHR 2027/4885LMNA 3677/4885ALDH1A1 1136/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.