SCHEMBL4266350

SCHEMBL4266350

CCO[Si](C)(OCC)c1cccc(C2CC(=O)OC2=O)c1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.38
ALDH2 P05091 1/20 0.38
SIRT2 Q8IXJ6 6/20 0.36
MAPT P10636 3/20 0.34
TP53 P04637 2/20 0.34
THRB P10828 1/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
KDM4E B2RXH2 1/20 0.34
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CTRC Q99895 1/20 0.33
HPGD P15428 2/20 0.33
GAA P10253 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1664564 0.90 ALDH1A1 (0.38) ALDH1A1ALDH2SIRT2MAPTTP53
SCHEMBL4275430 0.84 ALDH1A1 (0.37) ALDH1A1SIRT2MAPTTHRBMEN1
SCHEMBL1664746 0.83 ALDH1A1 (0.40) ALDH1A1ALDH2SIRT2MAPTTP53
SCHEMBL11317303 0.77 ALDH1A1 (0.47) ALDH1A1ALDH2SIRT2MAPTTP53
SCHEMBL1664805 0.76 ALDH1A1 (0.37) ALDH1A1SIRT2MAPTTHRBMEN1
SCHEMBL10690037 0.72 SIRT2 (0.56) ALDH1A1SIRT2MAPTMEN1KMT2A
SCHEMBL2957216 0.72 TP53 (0.32) TP53
SCHEMBL31121835 0.70 CTRC (0.47) ALDH1A1ALDH2SIRT2MAPTTP53
SCHEMBL28860894 0.70 ALDH1A1 (0.54) ALDH1A1ALDH2SIRT2MEN1KMT2A
SCHEMBL28226010 0.70 ALDH1A1 (0.40) ALDH1A1ALDH2SIRT2MAPTTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
CN-105717743-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN disclosed
CN-113671791-A Black photosensitive resin composition, black pattern, color filter and liquid crystal display device 奇美实业股份有限公司 2021-11-19 CN disclosed
CN-112859522-A Negative photosensitive resin composition, black matrix, color filter and display 奇美实业股份有限公司 2021-05-28 CN disclosed
CN-112147842-A Black photosensitive resin composition, black pattern and liquid crystal display device 奇美实业股份有限公司 2020-12-29 CN disclosed
CN-107003604-B Photosensitive resin composition, method for producing color filter, and liquid crystal display device 奇美实业股份有限公司 2020-08-11 CN disclosed
CN-106233203-B Photosensitive resin composition, color filter and liquid crystal display element thereof 奇美实业股份有限公司 2020-07-14 CN disclosed
CN-106918994-B Photosensitive resin composition for black matrix and application thereof 奇美实业股份有限公司 2020-04-28 CN disclosed
US-10591816-B2 Photosensitive resin composition, color filter, and liquid crystal display element thereof CHI MEI CORPORATION (TW) 2020-03-17 US disclosed
CN-110658680-A Photosensitive resin composition, black matrix, color filter and display 奇美实业股份有限公司 2020-01-07 CN disclosed
US-20160178813-A1 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2016-06-23 US disclosed
US-20160054651-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2016-02-25 US disclosed
US-20160011509-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS CHI MEI CORPORATION (TW) 2016-01-14 US disclosed
US-20150226892-A1 ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS CHI MEI CORPORATION (TW) 2015-08-13 US disclosed
US-20150153646-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS CHI MEI CORPORATION (TW) 2015-06-04 US disclosed
US-9029052-B1 Photosensitive resin composition, color filter and method for manufacturing the same, and liquid crystal display apparatus CHI MEI CORPORATION (TW) 2015-05-12 US disclosed
US-20150060746-A1 ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, LIQUID CRYSTAL DISPLAY APPARATUS CHI MEI CORPORATION (TW) 2015-03-05 US disclosed
US-8420770-B2 Inkjet ink JNC CORPORATION (JP) 2013-04-16 US disclosed
EP-2053097-A1 Inkjet ink Chisso Corporation (JP) 2009-04-29 EP disclosed
US-20090104414-A1 INKJET INK CHISSO CORPORATION (JP) 2009-04-23 US disclosed