SCHEMBL4275809

SCHEMBL4275809

CCO[Si](OCC)(OCC)C(C)(C(=O)O)c1ccc(N=Nc2ccccc2OC)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 7/20 0.40
MEN1 O00255 6/20 0.40
MAPT P10636 9/20 0.40
L3MBTL1 Q9Y468 4/20 0.40
NPSR1 Q6W5P4 3/20 0.40
GAA P10253 1/20 0.40
NOS3 P29474 2/20 0.36
NOS1 P29475 2/20 0.36
NOS2 P35228 2/20 0.36
PPARA Q07869 2/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
ALDH1A1 P00352 4/20 0.36
MAPK1 P28482 2/20 0.36
POLB P06746 1/20 0.36
PKM P14618 1/20 0.36
ALPL P05186 1/20 0.36
ALPG P10696 1/20 0.36
TDP1 Q9NUW8 2/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL240934 0.84 PPARA (0.46) KMT2AMEN1MAPTL3MBTL1PPARA
SCHEMBL6130465 0.80 PPARA (0.45) KMT2AMEN1MAPTGAAPPARA
SCHEMBL27908528 0.78 CYP2C19 (0.42) KMT2AMEN1MAPTALDH1A1POLB
SCHEMBL6681010 0.75 KMT2A (0.43) KMT2AMEN1MAPTL3MBTL1NPSR1
SCHEMBL1405268 0.71 KMT2A (0.58) KMT2AMEN1MAPTL3MBTL1NPSR1
SCHEMBL1405267 0.71 KMT2A (0.58) KMT2AMEN1MAPTL3MBTL1NPSR1
SCHEMBL31071661 0.71 KMT2A (0.58) KMT2AMEN1MAPTL3MBTL1NPSR1
Fluoride SCHEMBL28089840 0.69 KMT2A (0.57) KMT2AMEN1MAPTL3MBTL1NPSR1
SCHEMBL239068 0.69 CES2 (0.43) KMT2AMEN1MAPTGAAPPARA
SCHEMBL11145990 0.68 KMT2A (0.56) KMT2AMEN1MAPTL3MBTL1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2118204-A1 COMPOSITIONS, COATINGS AND FILMS FOR TRI-LAYER PATTERNING APPLICATIONS AND METHODS OF PREPARATION THEREOF Honeywell International Inc. (US) 2009-11-18 EP disclosed
WO-2008106379-A1 COMPOSITIONS, COATINGS AND FILMS FOR TRI-LAYER PATTERNING APPLICATIONS AND METHODS OF PREPARATION THEREOF HONEYWELL INTERNATIONAL INC. (US) 2008-09-04 WO disclosed
EP-1478683-A4 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INT INC (US) 2005-06-15 EP disclosed
EP-1478683-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY Honeywell International, Inc. (US) 2004-11-24 EP disclosed
WO-2003044079-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2003-05-30 WO disclosed