⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29004015 | 0.77 | CA2 (0.30) | — | |
| SCHEMBL17844395 | 0.74 | ALDH1A1 (0.30) | — | |
| Chloromethane SCHEMBL28080031 | 0.73 | CA2 (0.32) | — | |
| Ethane SCHEMBL23013321 | 0.73 | CES2 (0.33) | — | |
| Methyl Alcohol SCHEMBL7718124 | 0.73 | CA2 (0.32) | — | |
| SCHEMBL21494156 | 0.72 | — | — | |
| SCHEMBL4275361 | 0.72 | — | — | |
| SCHEMBL29365099 | 0.72 | FAAH (0.32) | — | |
| SCHEMBL52 | 0.72 | CA2 (0.35) | — | |
| SCHEMBL27623481 | 0.72 | CA2 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119998691-A | Antireflection film, liquid composition set, and method for producing antireflection film | 日本板硝子株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-111742391-B | Chemical solution for forming water-repellent protective film, method for producing same, and method for producing surface-treated body | 中央硝子株式会社 | 2025-02-18 | — | — | CN | disclosed |
| US-12163087-B2 | Surface treatment agent and method for manufacturing surface treatment body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-12-10 | — | — | US | disclosed |
| US-12098319-B2 | Liquid chemical for forming water-repellent protective film, method for preparing same, and method for manufacturing surface-treated body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-09-24 | — | — | US | disclosed |
| WO-2024080149-A1 | ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM | 日本板硝子株式会社 | 2024-04-18 | — | — | WO | disclosed |
| US-11670498-B2 | Surface treatment agent and surface-treated body manufacturing method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-06-06 | — | — | US | disclosed |
| US-20220325156-A1 | Surface Treatment Agent and Method for Manufacturing Surface Treatment Body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-10-13 | — | — | US | disclosed |
| EP-3979004-A1 | SURFACE TREATMENT AGENT AND METHOD FOR MANUFACTURING SURFACE TREATMENT BODY | Central Glass Company, Limited (JP) | 2022-04-06 | — | — | EP | disclosed |
| US-11282709-B2 | Chemical agent for forming water repellent protective film and surface treatment method for wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| CN-114008538-A | Surface treatment agent and method for producing surface-treated body | 中央硝子株式会社 | 2022-02-01 | — | — | CN | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| CN-1669130-A | Interlayer adhesion promoter for low K material | HONEYWELL INT INC (US) | 2005-09-14 | — | — | CN | disclosed |