Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.33 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CASR | P41180 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13484060 | 0.89 | USP2 (0.40) | USP2LMNACYP1A2HTTLPAR5 | |
| SCHEMBL13790799 | 0.87 | USP2 (0.39) | USP2LMNACYP1A2HTTLPAR5 | |
| SCHEMBL428119 | 0.85 | USP2 (0.55) | USP2LMNACYP1A2AGTR1HTT | |
| SCHEMBL13978960 | 0.85 | USP2 (0.42) | USP2LMNACYP1A2HTTLPAR5 | |
| SCHEMBL16710539 | 0.84 | HTT (0.56) | USP2CYP1A2HTTLPAR5HSD17B10 | |
| SCHEMBL14089863 | 0.84 | USP2 (0.53) | USP2LMNACYP1A2AGTR1HTT | |
| SCHEMBL16588236 | 0.84 | USP2 (0.53) | USP2LMNACYP1A2AGTR1HTT | |
| SCHEMBL25638703 | 0.84 | USP2 (0.53) | USP2LMNACYP1A2AGTR1HTT | |
| SCHEMBL7736607 | 0.84 | USP2 (0.37) | USP2LMNACYP1A2AGTR1TSHR | |
| SCHEMBL13790470 | 0.84 | USP2 (0.37) | USP2HTTLPAR5HSD17B10CASR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107849068-B | Method for preparing polyhedral oligomeric silsesquioxanes | 株式会社LG化学 | 2020-09-11 | — | — | CN | claimed |
| US-10501583-B2 | Method for preparing polyhedral oligomeric silsesquioxane | LG CHEM, LTD. (KR) | 2019-12-10 | — | — | US | claimed |
| WO-2019079144-A1 | NON-TOXIC HIGH DENSITY FLUID FOR COMPLETION APPLICATIONS | Terves Inc. (US) | 2019-04-25 | — | — | WO | claimed |
| US-20190112516-A1 | Non-Toxic High-Density Fluid For Completion Applications | TERVES, LLC | 2019-04-18 | — | — | US | claimed |
| US-20180201734-A1 | METHOD FOR PREPARING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE | LG CHEM, LTD. (KR) | 2018-07-19 | — | — | US | claimed |
| US-6452573-B1 | Liquid crystal device comprising anchoring means on at least one confinement plate providing a degenerated orientation | NEMOPTIC, S.A. (FR) | 2002-09-17 | — | — | US | claimed |
| CN-1228168-A | Liquid crystal device comprising means for anchoring on at least one confinement plate producing a degenerate orientation | CENTRE NAT RECH SCIENT (FR) | 1999-09-08 | — | — | CN | claimed |
| EP-0912914-A1 | LIQUID CRYSTAL DEVICE COMPRISING ANCHORING MEANS ON AT LEAST ONE CONFINEMENT PLATE PROVIDING A DEGENERATED ORIENTATION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 1999-05-06 | — | — | EP | claimed |
| WO-1998050821-A1 | LIQUID CRYSTAL DEVICE COMPRISING ANCHORING MEANS ON AT LEAST ONE CONFINEMENT PLATE PROVIDING A DEGENERATED ORIENTATION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) | 1998-11-12 | — | — | WO | claimed |
| JP-11116681-A | — | — | None | — | — | JP | disclosed |
| CN-118382664-A | Condensation curable composition | 迈图高新材料公司 | 2024-07-23 | — | — | CN | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| CN-1228168-A | Liquid crystal device comprising means for anchoring on at least one confinement plate producing a degenerate orientation | CENTRE NAT RECH SCIENT (FR) | 1999-09-08 | — | — | CN | disclosed |
| EP-0912914-A1 | LIQUID CRYSTAL DEVICE COMPRISING ANCHORING MEANS ON AT LEAST ONE CONFINEMENT PLATE PROVIDING A DEGENERATED ORIENTATION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 1999-05-06 | — | — | EP | disclosed |
| JP-H11116681-A | POLYMETHYLSILYLSESQUIOXANE PARTICLE AND DISPERSION OF THE SAME IN HYDROPHILIC SOLVENT | TAKEMOTO OIL & FAT CO LTD | 1999-04-27 | — | — | JP | disclosed |
| WO-1998050821-A1 | LIQUID CRYSTAL DEVICE COMPRISING ANCHORING MEANS ON AT LEAST ONE CONFINEMENT PLATE PROVIDING A DEGENERATED ORIENTATION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) | 1998-11-12 | — | — | WO | disclosed |
| US-5357024-A | Method for preparing a polysiloxane and titanate composition for high refractive index coatings | ESSILOR INTERNATIONAL (FR) | 1994-10-18 | — | — | US | disclosed |
| US-4770781-A | CHROMATOGRAPHY | MERCK & CO., INC. (US) | 1988-09-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | USP2 731/4885LMNA 2563/4885CYP1A2 2955/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | USP2 731/4885LMNA 2563/4885CYP1A2 2955/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.