SCHEMBL431218

SCHEMBL431218

c1ccc(O[Si](Oc2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.43
TSHR P16473 1/20 0.43
CA4 P22748 1/20 0.39
ALDH1A1 P00352 1/20 0.37
RECQL P46063 1/20 0.37
KCNA3 P22001 1/20 0.36
CA5A P35218 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
KMT2A Q03164 2/20 0.33
KCNH2 Q12809 1/20 0.33
NR1H2 P55055 1/20 0.33
BAX Q07812 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GLA P06280 1/20 0.33
MAPT P10636 1/20 0.33
MAOA P21397 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA9 Q16790 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704591 0.97 LTA4H (0.41) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL1482717 0.90 LTA4H (0.39) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL19816620 0.85 CA4 (0.44) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL1930954 0.85 LTA4H (0.36) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL3054931 0.84 MAOA (0.52) TSHRALDH1A1KMT2AKDM4EMAPT
SCHEMBL3869811 0.84 LMNA (0.42) LTA4HTSHRCA4ALDH1A1KMT2A
SCHEMBL3875429 0.84 LMNA (0.42) TSHRALDH1A1KMT2AMAPTMEN1
SCHEMBL1482495 0.82 LTA4H (0.33) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL5382078 0.80 LTA4H (0.39) LTA4HTSHRCA4ALDH1A1RECQL
SCHEMBL978832 0.80 LTA4H (0.45) LTA4HTSHRCA4ALDH1A1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 458 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114545739-A High-sensitivity positive photoresist composition, synthesis method thereof and cured film 深圳迪道微电子科技有限公司 2022-05-27 CN claimed
US-11059920-B2 Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions BRIDGESTONE CORPORATION (JP) 2021-07-13 US claimed
US-20190169330-A1 Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions BRIDGESTONE CORPORATION (JP) 2019-06-06 US claimed
EP-3491030-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS Bridgestone Corporation (JP) 2019-06-05 EP claimed
WO-2018022994-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS BRIDGESTONE CORPORATION (JP) 2018-02-01 WO claimed
US-20120184702-A1 PROCESS FOR PRODUCING A COMPOSITE MATERIAL BASF SE (DE) 2012-07-19 US claimed
US-7499618-B2 Optical element KONICA MINOLTA OPTO, INC. (JP) 2009-03-03 US claimed
US-7129311-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-10-31 US claimed
US-20060159861-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-07-20 US claimed
EP-1635194-A1 OPTICAL ELEMENT Konica Minolta Opto, Inc. (JP) 2006-03-15 EP claimed
EP-1573086-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES Arch Specialty Chemicals, Inc. (US) 2005-09-14 EP claimed
US-20050078926-A1 Unknown KONICA MINOLTA OPTO, INC. (JP) 2005-04-14 US claimed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US claimed
WO-2004027110-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES ARCH SPECIALTY CHEMICALS, INC. (US) 2004-04-01 WO claimed
EP-0447066-B2 Pneumatic tyres BRIDGESTONE CORP (JP) 2000-08-16 EP claimed
US-5409969-A Comprising silica filler, carbon black, silane coupler, living polymer of butadiene-styrene BRIDGESTONE CORPORATION (JP) 1995-04-25 US claimed
EP-0447066-A1 Pneumatic tyres Bridgestone Corporation (JP) 1991-09-18 EP claimed
EP-3943471-B1 METHOD FOR PRODUCING SILANE COMPOUND MITSUBISHI GAS CHEMICAL CO (JP) 2025-09-10 EP disclosed
EP-0299074-A1 TIRE Bridgestone Corporation (JP) 1989-01-18 EP disclosed
EP-0226208-A2 Insulating film for semiconductor, production of the same and liquid composition for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-06-24 EP disclosed