Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | LTA4H | P09960 | 3/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.33 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.33 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.33 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.33 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.33 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.33 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MTNR1A | P48039 | 4/20 | 0.33 |
| ▸ | MTNR1B | P49286 | 4/20 | 0.33 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2397780 | 0.86 | LMNA (0.38) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL430249 | 0.83 | LMNA (0.39) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL432208 | 0.78 | CA4 (0.42) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL329175 | 0.78 | CA4 (0.42) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL305460 | 0.78 | SCN4A (0.37) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL28823173 | 0.78 | LTA4H (0.35) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL3680660 | 0.78 | LTA4H (0.35) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL26661020 | 0.78 | LTA4H (0.35) | LMNALTA4HMAOAPTGS1CA4 | |
| SCHEMBL8416691 | 0.76 | ALDH1A1 (0.37) | LMNALTA4HMAOACA4TSHR | |
| SCHEMBL19816599 | 0.76 | LTA4H (0.38) | LMNALTA4HMAOAPTGS1CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 283 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024190380-A1 | SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT | 東京応化工業株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117413005-A | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2024-01-16 | — | — | CN | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6235101-B1 | SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |