SCHEMBL2397780

SCHEMBL2397780

CCCC(C)[Si](Oc1ccccc1)(Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.38
POLB P06746 1/20 0.38
LTA4H P09960 3/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
ALDH1A1 P00352 1/20 0.37
AOC3 Q16853 1/20 0.37
PPARG P37231 2/20 0.36
PPARA Q07869 2/20 0.36
MAOA P21397 1/20 0.35
PTGS1 P23219 1/20 0.35
CA4 P22748 1/20 0.34
ADORA3 P0DMS8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5266548 0.86 MTNR1A (0.40) LMNAPOLBSMN1; SMN2ALDH1A1PPARG
SCHEMBL432009 0.86 LMNA (0.39) LMNALTA4HALDH1A1MAOAPTGS1
SCHEMBL6715247 0.77 LTA4H (0.36) LMNALTA4HSMN1; SMN2ALDH1A1MAOA
SCHEMBL329175 0.76 CA4 (0.42) LMNAPOLBLTA4HMAOAPTGS1
SCHEMBL432208 0.76 CA4 (0.42) LMNAPOLBLTA4HMAOAPTGS1
SCHEMBL19816599 0.74 LTA4H (0.38) LMNALTA4HSMN1; SMN2ALDH1A1MAOA
SCHEMBL5724911 0.74 HPGD (0.37) LMNALTA4HSMN1; SMN2ALDH1A1
SCHEMBL430249 0.73 LMNA (0.39) LMNALTA4HALDH1A1MAOAPTGS1
SCHEMBL28404949 0.73 PPARG (0.41) LMNAPOLBSMN1; SMN2ALDH1A1PPARG
SCHEMBL11782987 0.72 CA4 (0.39) LMNAPOLBLTA4HMAOAPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8734906-B2 Films and method of production thereof BRISMAT INC. (US) 2014-05-27 US disclosed
US-8283260-B2 Process for restoring dielectric properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-10-09 US disclosed
US-20110223329-A1 Films and method of production thereof UNIVERSITY OF QUEENSLAND (AU) 2011-09-15 US disclosed
US-20100041234-A1 Process For Restoring Dielectric Properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-20090298671-A1 Compositions for Preparing Low Dielectric Materials Containing Solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US disclosed
US-7482676-B2 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-01-27 US disclosed
US-20080264672-A1 Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-10-30 US disclosed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US disclosed
EP-1959485-A2 Activated chemical process for enhancing material properties of dielectric films Air Products and Chemicals, Inc. (US) 2008-08-20 EP disclosed
US-20060249818-A1 Compositions for preparing low dielectric materials VERSUM MATERIALS US, LLC 2006-11-09 US disclosed
US-7122880-B2 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2006-10-17 US disclosed
US-20060183055-A1 Method for defining a feature on a substrate VERSUM MATERIALS US, LLC 2006-08-17 US disclosed
EP-1691410-A2 Method for defining a feature on a substrate Air Products and Chemicals, Inc. (US) 2006-08-16 EP disclosed
US-20050260420-A1 Low dielectric materials and methods for making same VERSUM MATERIALS US, LLC 2005-11-24 US disclosed
EP-1583141-A2 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-10-05 EP disclosed
EP-1577935-A2 Compositions for preparing low dielectric materials containing solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-09-21 EP disclosed
US-20050196535-A1 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. 2005-09-08 US disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed