SCHEMBL432262

SCHEMBL432262

CCCC[Si](OCC(C)C)(OCC(C)C)OCC(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5028336 0.93 LMNA (0.34) LMNA
SCHEMBL35210073 0.91 LMNA (0.37) LMNA
SCHEMBL35210072 0.91 LMNA (0.37) LMNA
SCHEMBL35210071 0.91 LMNA (0.37) LMNA
SCHEMBL430953 0.85
SCHEMBL2960926 0.83
SCHEMBL2960798 0.81
SCHEMBL429488 0.79 ALDH1A1 (0.32)
SCHEMBL6574221 0.79
SCHEMBL29655579 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8466229-B2 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2013-06-18 US disclosed
US-8362199-B2 Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation HITACHI CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20120231575-A1 METHOD FOR PRODUCING SOLAR CELL HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-09-13 US disclosed
EP-2495770-A1 METHOD FOR PRODUCING SOLAR CELL Hitachi Chemical Company, Ltd. (JP) 2012-09-05 EP disclosed
EP-2495771-A1 SOLAR CELL Hitachi Chemical Company, Ltd. (JP) 2012-09-05 EP disclosed
US-8253251-B2 Method for producing low-k film, semiconductor device, and method for manufacturing the same ELPIDA MEMORY, INC. (JP) 2012-08-28 US disclosed
US-20120211076-A1 SOLAR CELL HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-08-23 US disclosed
US-8158981-B2 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-04-17 US disclosed
US-20120021190-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-01-26 US disclosed
US-20110313122-A1 BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION MATSUTANI HIROSHI (JP) 2011-12-22 US disclosed
US-20060047034-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2006-03-02 US disclosed
US-20050266344-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-12-01 US disclosed
US-20050255326-A1 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts HITACHI CHEMICAL CO., LTD. (JP) 2005-11-17 US disclosed
US-20050239953-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-10-27 US disclosed
US-20050119394-A1 Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties HITACHI CHEMICAL CO., LTD. (JP) 2005-06-02 US disclosed
US-20040213911-A1 Method for forming porous film SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-28 US disclosed
EP-0195497-A2 Catalyst component for olefin polymerization TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1986-09-24 EP disclosed
EP-0193281-A2 Catalyst component for olefin polymerization TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1986-09-03 EP disclosed
EP-0193280-A2 Catalyst component for olefin polymerization TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1986-09-03 EP disclosed
EP-0186322-A2 Process for producing a catalyst component for polymerization of olefins TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1986-07-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110313122-A1 BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION GRIK5, GJA1, SLC9A5 LMNA 1693/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.