Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 9/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.66 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.66 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.66 |
| ▸ | ATM | Q13315 | 2/20 | 0.66 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.66 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.66 |
| ▸ | SMN1; SMN2 | Q16637 | 7/20 | 0.61 |
| ▸ | NPC1 | O15118 | 6/20 | 0.61 |
| ▸ | ATR | Q13535 | 1/20 | 0.60 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.59 |
| ▸ | HPGD | P15428 | 7/20 | 0.59 |
| ▸ | TSHR | P16473 | 4/20 | 0.59 |
| ▸ | MAPT | P10636 | 4/20 | 0.58 |
| ▸ | NFKB1 | P19838 | 3/20 | 0.58 |
| ▸ | NFKB2 | Q00653 | 3/20 | 0.58 |
| ▸ | RELA | Q04206 | 3/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29355388 | 1.00 | RAB9A (0.66) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL19932454 | 0.97 | RAB9A (0.67) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL12765590 | 0.92 | RAB9A (0.66) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL13134513 | 0.92 | RAB9A (0.62) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL12765576 | 0.91 | RAB9A (0.73) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL186871 | 0.91 | ALOX15 (0.69) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL29408668 | 0.91 | ALOX15 (0.69) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL1720737 | 0.89 | HSD17B10 (0.70) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL12721796 | 0.87 | ALDH1A1 (0.56) | RAB9AALDH1A1KDM4EHSD17B10ATM | |
| SCHEMBL12914292 | 0.87 | ALOX15 (0.65) | RAB9AALDH1A1KDM4EHSD17B10ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114685704-A | Plastic scintillation microsphere and synthetic method thereof | 中国辐射防护研究院 | 2022-07-01 | — | — | CN | claimed |
| CN-114671969-A | Polystyrene scintillation particle and preparation method thereof | 中国辐射防护研究院 | 2022-06-28 | — | — | CN | claimed |
| CN-114672103-A | Plastic scintillation microsphere and preparation method thereof | 中国辐射防护研究院 | 2022-06-28 | — | — | CN | claimed |
| CN-113185628-A | Polystyrene scintillation microsphere and preparation method thereof | 中国辐射防护研究院 | 2021-07-30 | — | — | CN | claimed |
| US-7611818-B2 | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-11-03 | — | — | US | claimed |
| CN-114685704-A | Plastic scintillation microsphere and synthetic method thereof | 中国辐射防护研究院 | 2022-07-01 | — | — | CN | disclosed |
| CN-114672103-A | Plastic scintillation microsphere and preparation method thereof | 中国辐射防护研究院 | 2022-06-28 | — | — | CN | disclosed |
| CN-114671969-A | Polystyrene scintillation particle and preparation method thereof | 中国辐射防护研究院 | 2022-06-28 | — | — | CN | disclosed |
| CN-113185628-A | Polystyrene scintillation microsphere and preparation method thereof | 中国辐射防护研究院 | 2021-07-30 | — | — | CN | disclosed |
| WO-2020130456-A1 | COMPOUND FOR ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTRIC ELEMENT USING SAME, AND ELECTRONIC DEVICE COMPRISING ORGANIC ELECTRIC ELEMENT | 덕산네오룩스 주식회사 | 2020-06-25 | — | — | WO | disclosed |
| CN-101980082-B | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board | HITACHI CHEMICAL CO LTD | 2013-07-17 | — | — | CN | disclosed |
| US-7611818-B2 | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20070077514-A1 | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2007-04-05 | — | — | US | disclosed |
| EP-0532798-B1 | An electroluminescent element | ASAHI CHEMICAL IND (JP) | 1995-12-06 | — | — | EP | disclosed |
| EP-0532798-A1 | An electroluminescent element | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-03-24 | — | — | EP | disclosed |