Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | PAM | P19021 | 1/20 | 0.38 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.38 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | FBP1 | P09467 | 3/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7219057 | 0.82 | ALDH1A1 (0.44) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL4911765 | 0.78 | ALDH1A1 (0.41) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL10533493 | 0.78 | ALDH1A1 (0.41) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL627745 | 0.78 | TSHR (0.45) | ALDH1A1TSHRAKR1C3RECQLMEN1 | |
| SCHEMBL7696952 | 0.78 | FBP1 (0.41) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL7731176 | 0.78 | FBP1 (0.41) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL2850504 | 0.77 | ALDH1A1 (0.39) | ALDH1A1TSHRAKR1C3CYP3A4CYP2C9 | |
| SCHEMBL7603630 | 0.77 | MTNR1A (0.49) | ALDH1A1TSHRAKR1C1ESR1MEN1 | |
| SCHEMBL7603627 | 0.77 | MTNR1A (0.49) | ALDH1A1TSHRAKR1C1ESR1MEN1 | |
| SCHEMBL7756538 | 0.77 | MTNR1A (0.49) | ALDH1A1TSHRAKR1C1ESR1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859187-B2 | Method of forming resist pattern and negative resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8349543-B2 | Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material | TOKYO OHKA KOGYO CO. LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8263322-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-11 | — | — | US | disclosed |
| US-8124312-B2 | Method for forming pattern, and material for forming coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8101013-B2 | Film-forming material and method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8025923-B2 | Method for manufacturing a structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7932013-B2 | Pattern coating material and pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20100167217-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| CN-1965265-B | Chemically amplified resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD | 2010-06-30 | — | — | CN | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-RE39635-E1 | Polymerizing a hydrophobic siloxane prepolymer and a silylated hydrophobic monomer and hydrolyzing the resulting polymer polymerization is carried out by using one of heat or ultraviolet light | VANDERLAAN DOUGLAS G | 2007-05-15 | — | — | US | disclosed |
| EP-0990668-A1 | Optically transparent hydrogels and processes for their production | JOHNSON & JOHNSON VISION PRODUCTS, INC. (US) | 2000-04-05 | — | — | EP | disclosed |
| US-6031059-A | POLYMERIZING A HYDROPHOBIC SILOXANE PREPOPLYMER AND A SILYLATED HYDROPHILIC MONOMER AND HYDROLYZING THE RESULTING POLYMER WHEREIN POLYMERIZING IS CARRIED OUT BY USING ONE OF HEAT POLYMERIZATION, ULTRAVIOLET LIGHT | JOHNSON & JOHNSON VISION PRODUCTS, INC. (US) | 2000-02-29 | — | — | US | disclosed |
| US-5529886-A | PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-06-25 | — | — | US | disclosed |
| EP-0514994-B1 | Liquid compositions based on polyisocyanates and epoxides | ENICHEM SPA (IT) | 1995-09-06 | — | — | EP | disclosed |
| US-5442087-A | Preparing offset printing plates and photoresists | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | disclosed |
| US-5288833-A | Thermosetting resin with high softening point | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1994-02-22 | — | — | US | disclosed |
| EP-0514994-A1 | Liquid compositions based on polyisocyanates and epoxides | ENICHEM S.p.A. (IT) | 1992-11-25 | — | — | EP | disclosed |