⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775395 | 0.86 | — | — | |
| SCHEMBL2035297 | 0.81 | — | — | |
| SCHEMBL23579725 | 0.79 | ANPEP (0.33) | — | |
| SCHEMBL5701741 | 0.75 | — | — | |
| SCHEMBL6661203 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL703802 | 0.74 | — | — | |
| SCHEMBL28489066 | 0.74 | — | — | |
| SCHEMBL564570 | 0.74 | OPRM1 (0.46) | — | |
| SCHEMBL483472 | 0.74 | EPHX1 (0.42) | — | |
| SCHEMBL37493 | 0.73 | CA12 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113893827-A | Fluorine adsorption material and preparation method and application thereof | 苏州博萃循环科技有限公司 | 2022-01-07 | — | — | CN | claimed |
| CN-113797883-A | High-selectivity nickel-extracting nano adsorbent and preparation method thereof | 江苏海普功能材料有限公司 | 2021-12-17 | — | — | CN | claimed |
| CN-113000028-A | Preparation method of adsorbent for recovering phosphoric acid in waste acid | 临沂海普新材料科技有限公司 | 2021-06-22 | — | — | CN | claimed |
| CN-112755972-A | Preparation of silicon-based resin and application of silicon-based resin as defluorination adsorbent | 江苏海普功能材料有限公司 | 2021-05-07 | — | — | CN | claimed |
| CN-109777292-B | High-hardness high-glossiness hydrophobic coating material for substrate surface and application method thereof | 新辉（中国）新材料有限公司 | 2021-05-04 | — | — | CN | claimed |
| CN-109762464-B | Room-temperature-cured high-hardness high-glossiness hydrophobic coating material and preparation method thereof | 新辉（中国）新材料有限公司 | 2021-04-30 | — | — | CN | claimed |
| CN-112652774-A | Copper foil composite material and preparation method thereof, negative pole piece and lithium ion battery | 浙江大学 | 2021-04-13 | — | — | CN | claimed |
| WO-2023167060-A1 | LAMINATE | 三井化学株式会社 | 2023-09-07 | — | — | WO | disclosed |
| CN-113893827-A | Fluorine adsorption material and preparation method and application thereof | 苏州博萃循环科技有限公司 | 2022-01-07 | — | — | CN | disclosed |
| CN-113797883-A | High-selectivity nickel-extracting nano adsorbent and preparation method thereof | 江苏海普功能材料有限公司 | 2021-12-17 | — | — | CN | disclosed |
| CN-113000028-A | Preparation method of adsorbent for recovering phosphoric acid in waste acid | 临沂海普新材料科技有限公司 | 2021-06-22 | — | — | CN | disclosed |
| CN-112755972-A | Preparation of silicon-based resin and application of silicon-based resin as defluorination adsorbent | 江苏海普功能材料有限公司 | 2021-05-07 | — | — | CN | disclosed |
| CN-109777292-B | High-hardness high-glossiness hydrophobic coating material for substrate surface and application method thereof | 新辉（中国）新材料有限公司 | 2021-05-04 | — | — | CN | disclosed |
| CN-109762464-B | Room-temperature-cured high-hardness high-glossiness hydrophobic coating material and preparation method thereof | 新辉（中国）新材料有限公司 | 2021-04-30 | — | — | CN | disclosed |
| CN-112717892-A | Copper-removing adsorbent for purifying cobalt-nickel electrolyte and preparation method thereof | 江苏海普功能材料有限公司 | 2021-04-30 | — | — | CN | disclosed |
| CN-112652774-A | Copper foil composite material and preparation method thereof, negative pole piece and lithium ion battery | 浙江大学 | 2021-04-13 | — | — | CN | disclosed |
| US-20090092801-A1 | NONAQUEOUS INKJET INK, INK COMPOSITION FOR INKJET RECORDING, AND SUBSTRATE FOR COLOR FILTER | TOYO INK MANUFACTURING CO., LTD. (JP) | 2009-04-09 | — | — | US | disclosed |
| US-20010002305-A1 | Toner and method for producing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-05-31 | — | — | US | disclosed |