⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4335010 | 0.86 | — | — | |
| SCHEMBL28489066 | 0.78 | — | — | |
| SCHEMBL819523 | 0.73 | OPRM1 (0.39) | — | |
| SCHEMBL3452062 | 0.70 | EPHX1 (0.31) | — | |
| SCHEMBL564570 | 0.70 | OPRM1 (0.46) | — | |
| SCHEMBL23579493 | 0.69 | ANPEP (0.30) | — | |
| SCHEMBL637874 | 0.69 | — | — | |
| SCHEMBL4237452 | 0.69 | CYP2C19 (0.38) | — | |
| SCHEMBL23579725 | 0.68 | ANPEP (0.33) | — | |
| SCHEMBL707438 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250223479-A1 | CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD FOR POLISHING TUNGSTEN USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-07-10 | — | — | US | claimed |
| US-20230324267-A1 | DEVICE FOR REDUCING THE VOLUME OF A SAMPLE, A KIT COMPRISING THE SAME, AND USES THEREOF | CHUNG YUAN CHRISTIAN UNIVERSITY (TW) | 2023-10-12 | — | — | US | claimed |
| US-8709959-B2 | Puncture resistant fabric | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2014-04-29 | — | — | US | claimed |
| US-20260139154-A1 | CMP SLURRY COMPOSITION FOR POLISHING PATTERNED TUNGSTEN WAFER AND METHOD OF POLISHING PATTERNED TUNGSTEN WAFER USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-05-21 | — | — | US | disclosed |
| EP-4047051-B1 | COMPOSITION FOR ENCAPSULANT FILM COMPRISING ETHYLENE/ALPHA-OLEFIN COPOLYMER AND ENCAPSULANT FILM COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2026-05-20 | — | — | EP | disclosed |
| US-12552962-B2 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | disclosed |
| EP-4450549-B1 | ENCAPSULANT FILM COMPOSITION AND ENCAPSULANT FILM COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-12-10 | — | — | EP | disclosed |
| EP-4645499-A1 | SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-11-05 | — | — | EP | disclosed |
| US-20250337103-A1 | SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-10-30 | — | — | US | disclosed |
| US-20250329878-A1 | SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-10-23 | — | — | US | disclosed |
| EP-3988614-B1 | COMPOSITION FOR ENCAPSULANT FILM COMPRISING ETHYLENE/ALPHA-OLEFIN COPOLYMER AND ENCAPSULANT FILM COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2025-08-13 | — | — | EP | disclosed |
| US-20120066980-A1 | Hydrophilic and Hydrophobic Silane Surface Modification of Abrasive Grains | SAINT-GOBAIN ABRASIFS (FR) | 2012-03-22 | — | — | US | disclosed |
| US-8021449-B2 | Hydrophilic and hydrophobic silane surface modification of abrasive grains | SAINT-GOBAIN ABRASIVES, INC. (US) | 2011-09-20 | — | — | US | disclosed |
| EP-2364241-A2 | HYDROPHILIC AND HYDROPHOBIC SILANE SURFACE MODIFICATION OF ABRASIVE GRAINS | Saint-Gobain Abrasives, Inc. (US) | 2011-09-14 | — | — | EP | disclosed |
| WO-2011080649-A2 | PUNCTURE RESISTANT FABRIC | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2011-07-07 | — | — | WO | disclosed |
| WO-2011080678-A2 | WEARABLE ARTICLE THAT STIFFENS UPON SUDDEN FORCE | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2011-07-07 | — | — | WO | disclosed |
| US-20110159759-A1 | Puncture Resistant Fabric | KIMBERLY-CLARK WORLDWIDE, INC. | 2011-06-30 | — | — | US | disclosed |
| US-20110155141-A1 | Wearable Article That Stiffens Upon Sudden Force | KIMBERLY-CLARK WORLDWIDE, INC. | 2011-06-30 | — | — | US | disclosed |
| US-20090260297-A1 | Hydrophilic and hydrophobic silane surface modification of abrasive grains | SAINT-GOBAIN ABRASIFS (FR) | 2009-10-22 | — | — | US | disclosed |
| WO-2009129384-A2 | HYDROPHILIC AND HYDROPHOBIC SILANE SURFACE MODIFICATION OF ABRASIVE GRAINS | SAINT-GOBAIN ABRASIVES, INC. (US) | 2009-10-22 | — | — | WO | disclosed |