SCHEMBL4335507

SCHEMBL4335507

c1ccc(-c2ncc(-c3cccc4ccccc34)o2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.64
KDM4E B2RXH2 7/20 0.64
RAB9A P51151 6/20 0.64
HPGD P15428 6/20 0.64
MAPT P10636 5/20 0.64
NPC1 O15118 4/20 0.64
SMN1; SMN2 Q16637 4/20 0.64
TP53 P04637 3/20 0.64
GAA P10253 3/20 0.64
MAPK1 P28482 2/20 0.64
TDP1 Q9NUW8 2/20 0.64
L3MBTL1 Q9Y468 2/20 0.64
GLA P06280 2/20 0.64
TSHR P16473 2/20 0.59
ALOX15 P16050 1/20 0.59
CASP1 P29466 1/20 0.59
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
MITF O75030 1/20 0.51
HSD17B10 Q99714 4/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30987395 1.00 ALDH1A1 (0.64) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL23212809 0.89 HPGD (0.60) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL30355276 0.89 HPGD (0.60) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL4340233 0.88 KDM4E (0.58) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL29374630 0.87 RAB9A (0.62) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL75682 0.87 RAB9A (0.62) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL12914309 0.85 KDM4E (0.55) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL12914302 0.82 ALDH1A1 (0.60) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL12601783 0.82 ALOX15 (0.56) ALDH1A1KDM4ERAB9AHPGDMAPT
SCHEMBL4343347 0.81 ALOX15 (0.69) ALDH1A1KDM4ERAB9AHPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US claimed
CN-101980082-B Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL CO LTD 2013-07-17 CN disclosed
CN-1879060-B Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board HITACHI CHEMICAL CO LTD 2011-09-28 CN disclosed
CN-101980082-A Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL CO LTD 2011-02-23 CN disclosed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed
CN-1879060-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board HITACHI CHEMICAL CO LTD (JP) 2006-12-13 CN disclosed