SCHEMBL4340233

SCHEMBL4340233

c1ccc2c(-c3cnc(-c4cccc5ccccc45)o3)cccc2c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.58
ALDH1A1 P00352 9/20 0.58
HPGD P15428 8/20 0.58
MAPT P10636 7/20 0.58
RAB9A P51151 6/20 0.58
SMN1; SMN2 Q16637 5/20 0.58
NPC1 O15118 4/20 0.58
MAPK1 P28482 4/20 0.58
GAA P10253 3/20 0.58
TP53 P04637 3/20 0.58
L3MBTL1 Q9Y468 3/20 0.58
TDP1 Q9NUW8 2/20 0.58
GLA P06280 2/20 0.58
HSD17B10 Q99714 7/20 0.50
ESR1 P03372 1/20 0.48
ESR2 Q92731 1/20 0.48
ALOX15 P16050 4/20 0.47
BCHE P06276 1/20 0.47
ACHE P22303 1/20 0.47
ATM Q13315 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12914309 0.97 KDM4E (0.55) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL12601783 0.90 ALOX15 (0.56) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL29374630 0.88 RAB9A (0.62) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL75682 0.88 RAB9A (0.62) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL30987395 0.88 ALDH1A1 (0.64) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL4335507 0.88 ALDH1A1 (0.64) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL14785855 0.86 KDM4E (0.50) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL23212809 0.84 HPGD (0.60) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL30355276 0.84 HPGD (0.60) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL10910387 0.83 RAB9A (0.61) KDM4EALDH1A1HPGDMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US claimed
CN-104157333-B Electrode, an electronic device, and a method for manufacturing an optoelectronic device 英飞凌科技德累斯顿有限责任公司 2017-04-12 CN disclosed
US-7611818-B2 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-11-03 US disclosed
US-20070077514-A1 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-04-05 US disclosed