SCHEMBL4338418

SCHEMBL4338418

c1csc(-c2cc(-c3cccs3)cc(-c3cccs3)c2)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.58
CYP2E1 P05181 1/20 0.54
CYP3A4 P08684 1/20 0.54
CYP2A6 P11509 1/20 0.54
CYP2C9 P11712 1/20 0.54
CYP2B6 P20813 1/20 0.54
LTA4H P09960 1/20 0.54
KDM4E B2RXH2 2/20 0.48
MAPT P10636 2/20 0.48
MEN1 O00255 1/20 0.48
ALDH1A1 P00352 1/20 0.48
HPGD P15428 1/20 0.48
KMT2A Q03164 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
ERN1 O75460 5/20 0.47
PRMT6 Q96LA8 1/20 0.47
CYP17A1 P05093 1/20 0.47
CYP11B1 P15538 1/20 0.47
CYP11B2 P19099 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1334921 0.89 KCNH2 (0.59) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL28043530 0.88 KDM4E (0.54) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL7891948 0.88 KCNH2 (0.59) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL1334676 0.88 KCNH2 (0.48) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL1464252 0.85
SCHEMBL338810 0.85 LTA4H (0.70) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL14455886 0.83 DPP4 (0.55) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL788391 0.83 MAPT (0.54) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL9321862 0.83 KCNH2 (0.48) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9
SCHEMBL9193569 0.83 KCNH2 (0.48) KCNH2CYP2E1CYP3A4CYP2A6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119119499-A Metal organic framework material, preparation method thereof and application thereof in methane adsorption 浙江大学杭州国际科创中心 2024-12-13 CN claimed
CN-113501940-B D-A type conjugated polymer and preparation method and application thereof 广东工业大学 2023-01-20 CN claimed
CN-112755733-B Electropolymerization prepared self-supporting ILs @ CMP film for improving CO2/CH4Method of separating properties 北京理工大学 2022-04-08 CN claimed
CN-110165186-A A kind of poly- 1,3,5- tri- (2- thienyl) benzene/sulphur composite material and application 江西省科学院应用化学研究所 2019-08-23 CN claimed
CN-104119517-A Star-shaped silicon-containing polymer as well as preparation method and application thereof UNIV HANGZHOU NORMAL 2014-10-29 CN claimed
CN-119119499-B Metal organic framework material, preparation method thereof and application thereof in methane adsorption 浙江大学杭州国际科创中心 2026-03-20 CN disclosed
CN-121263039-A Organic solar cell based on three-dimensional solid additive and preparation method thereof 成都理工大学 2026-01-02 CN disclosed
CN-120795834-A Polymer binder containing star structure, preparation method and solid-state battery 江苏一特新材料有限责任公司 2025-10-17 CN disclosed
US-20250011590-A1 OPTICAL FILM AND POLARIZING PLATE TOSOH CORPORATION (JP) 2025-01-09 US disclosed
CN-119119499-A Metal organic framework material, preparation method thereof and application thereof in methane adsorption 浙江大学杭州国际科创中心 2024-12-13 CN disclosed
CN-119119499-A Metal organic framework material, preparation method thereof and application thereof in methane adsorption 浙江大学杭州国际科创中心 2024-12-13 CN disclosed
EP-4431989-A1 OPTICAL FILM AND POLARIZING PLATE Tosoh Corporation (JP) 2024-09-18 EP disclosed
US-20120053352-A1 BRANCHED COMPOUND, AND ORGANIC THIN FILM AND ORGANIC THIN FILM ELEMENT EACH COMPRISING SAME OSAKA UNIVERSITY (JP) 2012-03-01 US disclosed
CN-102329299-A Star-shaped oligothiophene derivative, preparation method and application thereof UNIV SOUTH CHINA TECH 2012-01-25 CN disclosed
EP-2407464-A1 BRANCHED COMPOUND, AND ORGANIC THIN FILM AND ORGANIC THIN FILM ELEMENT EACH COMPRISING SAME Sumitomo Chemical Company, Limited (JP) 2012-01-18 EP disclosed
US-7531619-B2 Process for producing dendrimer, building block compound, and process for producing thiophene compound TOYO GOSEI CO., LTD. (JP) 2009-05-12 US disclosed
EP-1535942-B1 METHOD FOR PRODUCING A ENDRIMER, BUILDING BLOCK COMPOUND, AND METHOD FOR PRODUCING A THIOPHENE COMPOUND TOYO GOSEI CO LTD (JP) 2007-04-11 EP disclosed
US-20060122364-A1 Process for producing dendrimer, building block compound, and process for producing thiophene compound TOYO GOSEI CO., LTD. (JP) 2006-06-08 US disclosed
EP-1535942-A1 PROCESS FOR PRODUCING DENDRIMER, BUILDING BLOCK COMPOUND, AND PROCESS FOR PRODUCING THIOPHENE COMPOUND Toyo Gosei Co., Ltd. (JP) 2005-06-01 EP disclosed
US-6436558-B1 SUBSTRATE HAVING PROVIDED THEREON AN ANODE FOR INJECTING HOLES, A CATHODE FOR INJECTING ELECTRONS, AND AT LEAST ONE ORGANIC COMPOUND LAYER THEREBETWEEN, WHEREIN THE ORGANIC COMPOUND LAYER CONTAINS AT LEAST ONE COMPOUND REPRESENTED BY FUJI PHOTO FILM CO., LTD. 2002-08-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060122364-A1 Process for producing dendrimer, building block compound, and process for producing thiophene compound CCKBR, MVD, DRD4 KCNH2 584/4885CYP2E1 1146/4885CYP3A4 258/4885
US-20120053352-A1 BRANCHED COMPOUND, AND ORGANIC THIN FILM AND ORGANIC THIN FILM ELEMENT EACH COMPRISING SAME BCR, SLC43A1, MOGAT2 KCNH2 520/4885CYP2E1 1029/4885CYP3A4 1770/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.