SCHEMBL434900

SCHEMBL434900

CCOC=C(C(=O)OCC(CC)(CO)CO)C(OCC)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HIF1A Q16665 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1827427 0.81
SCHEMBL379095 0.80 ALDH1A1 (0.37) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL4961102 0.80 ALDH1A1 (0.37) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL433986 0.76 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL433368 0.74 ALDH1A1 (0.31) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL226695 0.73 ALDH1A1 (0.39) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL4398992 0.72 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL8903487 0.71
SCHEMBL2637237 0.71 ALDH1A1 (0.34) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL8583775 0.68 ALDH1A1 (0.40) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11999157-B2 Transfer film, laminate, acoustic speaker, and method for producing laminate FUJIFILM CORPORATION (JP) 2024-06-04 US disclosed
WO-2024024842-A1 LAMINATE MANUFACTURING METHOD 富士フイルム株式会社 2024-02-01 WO disclosed
US-20240027897-A1 LAMINATE AND MANUFACTURING METHOD OF LAMINATE FUJIFILM CORPORATION (JP) 2024-01-25 US disclosed
US-20240004291-A1 COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, CURED FILM, AND DEVICE FUJIFILM CORPORATION (JP) 2024-01-04 US disclosed
WO-2023127889-A1 TRANSFER FILM, LAMINATE MANUFACTURING METHOD, LAMINATE, AND MICRO-LED DISPLAY ELEMENT 富士フイルム株式会社 2023-07-06 WO disclosed
WO-2023100553-A1 TRANSFER FILM, LAMINATE HAVING CONDUCTOR PATTERN, METHOD FOR PRODUCING LAMINATE HAVING CONDUCTOR PATTERN, AND METHOD FOR PRODUCING TRANSFER FILM 富士フイルム株式会社 2023-06-08 WO disclosed
US-20230102758-A1 PHOTOSENSITIVE TRANSFER MATERIAL, LIGHT SHIELDING MATERIAL, LED ARRAY, AND ELECTRONIC APPARATUS FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
US-20230097968-A1 PHOTOSENSITIVE TRANSFER MATERIAL, LIGHT SHIELDING MATERIAL, LED ARRAY, AND ELECTRONIC APPARATUS FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
US-20230094866-A1 PHOTOSENSITIVE TRANSFER MATERIAL FOR LED ARRAY, LIGHT SHIELDING MATERIAL FOR LED ARRAY, LED ARRAY, AND ELECTRONIC APPARATUS FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
US-20230100327-A1 COMPOSITION, DRIED PRODUCT, CURED SUBSTANCE, TRANSFER FILM, MANUFACTURING METHOD OF TRANSFER FILM, AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2023-03-30 US disclosed
EP-2103636-A1 FLUORINE-CONTAINING POLYMER AND RESIN COMPOSITION Chisso Corporation (JP) 2009-09-23 EP disclosed
EP-1825328-B1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO LTD (JP) 2009-04-15 EP disclosed
US-20090068600-A1 METHOD FOR ENHANCING OPTICAL STABILITY OF THREE-DIMENSIONAL MICROMOLDED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2009-03-12 US disclosed
US-20070292804-A1 Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2007-12-20 US disclosed
US-20060177762-A1 Negative photosensitive resin composition and negative photosensitive element HITACHI CHEMICAL CO., LTD. (JP) 2006-08-10 US disclosed
US-7067226-B2 Photosensitive film for circuit formation and process for producing printed wiring board HITACHI CHEMICAL CO., LTD. (JP) 2006-06-27 US disclosed
US-20040112859-A1 Photosensitive film for circuit formation and process for producing printed wiring board HITACHI CHEMICAL CO., LTD. (JP) 2004-06-17 US disclosed
US-6733873-B2 SATISFIES REQUIREMENTS FOR TRANSPARENCY, SLIPPERINESS, WINDING PROPERTIES, RESOLUTION AND RECYCLABILITY; RESIDUAL POLYCONDENSATION METAL CATALYST CONTENT OF LESS THAN 150 PPM, AND AN ANTIMONY CONTENT OF 15 MMOL % OR LESS TEIJIN LIMITED (JP) 2004-05-11 US disclosed
US-20020197496-A1 Polyester film as support for dry film resist TEIJIN LIMITED (JP) 2002-12-26 US disclosed
EP-1266923-A1 POLYESTER FILM AS SUPPORT FOR DRY FILM RESIST TEIJIN LIMITED (JP) 2002-12-18 EP disclosed