Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4961102 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL379095 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL4398992 | 0.87 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2785110 | 0.83 | THRB (0.33) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2637237 | 0.82 | ALDH1A1 (0.34) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL10357244 | 0.81 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL149736 | 0.81 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL336450 | 0.79 | ALDH1A1 (0.42) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL19447665 | 0.78 | GLO1 (0.50) | ALDH1A1MAPK1SMN1; SMN2GLO1LMNA | |
| SCHEMBL322511 | 0.78 | GLO1 (0.50) | ALDH1A1MAPK1SMN1; SMN2GLO1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 821 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036806-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12036808-B2 | Ink jet recording method using temporary curing radiation | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12024574-B2 | Light curable (meth)acrylate resin composition for thermoplastic elastomers bonding | HENKEL AG & CO. KGAA (DE) | 2024-07-02 | — | — | US | disclosed |
| EP-4389832-A1 | ACTIVE ENERGY RAY-CURABLE COMPOSITION, METHOD FOR PRODUCING LUMINOUS CURED PRODUCT, AND LUMINOUS FORMED BODY | KONICA MINOLTA, INC. (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240181795-A1 | IMAGE FORMING METHOD, IMAGE FORMING SYSTEM, POSTPROCESSING LIQUID, AND POSTPROCESSING LIQUID APPLYING APPARATUS | Konica Minolta, Inc. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-11987715-B2 | Radiation curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-21 | — | — | US | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| EP-3473683-B1 | ACTIVE RAY-CURABLE INKJET INK AND IMAGE FORMING METHOD | KONICA MINOLTA INC (JP) | 2024-04-10 | — | — | EP | disclosed |
| US-11952501-B2 | Ink set and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2024-04-09 | — | — | US | disclosed |
| EP-1958994-A1 | Ink set for inkjet recording and inkjet recording method | FUJIFILM Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20080149270-A1 | Curable composition of polymerized conjugated diolefin having uretane (meth)acrylate end groups, di(meth)acrylate, monoacrylate and photopolymerization initiator; water-soluble adhesives easily swellable/removeable from optical lenses, prisms, silicon wafers, semiconductor parts; packaging; solvent-free | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2008-06-26 | — | — | US | disclosed |
| EP-1900761-A1 | CURABLE COMPOSITION AND METHOD FOR TEMPORAL FIXATION OF STRUCTURAL MEMBER USING THE SAME | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2008-03-19 | — | — | EP | disclosed |
| US-20060257759-A1 | Colored photosensitive composition for color filter, color filter, and process for the production thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-11-16 | — | — | US | disclosed |
| US-20050261392-A1 | Photocurable resin composition and optical material | DSM IP ASSETS B.V. (NL) | 2005-11-24 | — | — | US | disclosed |
| US-20050228162-A1 | Novel polyether compound containing acid group and unsaturated group, process for producing the same, and resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| EP-1571469-A1 | COLORED PHOTOSENSITIVE COMPOSITION FOR COLOR FILTERS, COLOR FILTERS, AND PROCESS FOR THE PRODUCTION THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2005-09-07 | — | — | EP | disclosed |
| EP-1496077-A1 | NOVEL POLYETHER COMPOUND CONTAINING ACID GROUP AND UNSATURATED GROUP, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2005-01-12 | — | — | EP | disclosed |
| WO-2004033511-A1 | PHOTOCURABLE RESIN COMPOSITION AND OPTICAL MATERIAL | DSM IP ASSETS B.V. (NL) | 2004-04-22 | — | — | WO | disclosed |