Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3447989 | 0.78 | — | — | |
| SCHEMBL948785 | 0.78 | — | — | |
| SCHEMBL3036052 | 0.74 | — | — | |
| SCHEMBL5213565 | 0.74 | — | — | |
| SCHEMBL15555000 | 0.74 | — | — | |
| SCHEMBL548488 | 0.73 | — | — | |
| SCHEMBL4350680 | 0.71 | GSK3B (0.31) | ALDH1A1 | |
| SCHEMBL948881 | 0.71 | HTT (0.35) | ADORA3ALDH1A1 | |
| SCHEMBL4575397 | 0.70 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL4352906 | 0.69 | GLA (0.38) | ADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7224042-A | — | — | None | — | — | JP | disclosed |
| CN-107848983-B | Compound, resin, material for forming underlayer film for lithography, resist pattern, method for forming circuit pattern, and method for purifying resist pattern | 三菱瓦斯化学株式会社 | 2021-07-09 | — | — | CN | disclosed |
| US-10364314-B2 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-07-30 | — | — | US | disclosed |
| US-20180208703-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-26 | — | — | US | disclosed |
| EP-3327005-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-7614145-B2 | Method for manufacturing multilayer circuit board and resin base material | ZEON CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| CN-100496195-C | Mulitilayer circuit board, resin base material, and its production method | ZEON CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| US-20080217617-A1 | Thin Film Transistor, Wiring Board and Methods of Manufacturing the Same | ZEON CORPORATION (JP) | 2008-09-11 | — | — | US | disclosed |
| CN-100383278-C | Partial plating method, partially-plated resin base, method for manufacturing multilayer circuit board | ZEON CORP (JP) | 2008-04-23 | — | — | CN | disclosed |
| US-20050153059-A1 | Partial plating method, partially-plated resin base, method for manufacturing multilayered circuit board | ZEON CORPORATION (JP) | 2005-07-14 | — | — | US | disclosed |
| CN-1639384-A | Partial plating method, partially-plated resin base, method for manufacturing multilayer circuit board | ZEON CORP (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-20040237295-A1 | Multilayer circuit board and resin base material, and its production method | ZEON CORPORATION (JP) | 2004-12-02 | — | — | US | disclosed |
| CN-1552174-A | Mulitilayer circuit board, resin base material, and its production method | �ձ�������ʽ���� | 2004-12-01 | — | — | CN | disclosed |
| JP-H07224042-A | METHOD FOR SYNTHESIZING 4,5-DIFORMYLIMIDAZOLE COMPOUND AND NEW IMIDAZOLE COMPOUND | SHIKOKU CHEM CORP | 1995-08-22 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10364314-B2 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | TXNL1, RER1, MLLT1 | ADORA3 4563/4885ALDH1A1 1290/4885L3MBTL1 510/4885 |
| US-20180208703-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD | TXNL1, RER1, MLLT1 | ADORA3 4577/4885ALDH1A1 1307/4885L3MBTL1 517/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.