Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 12/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | MAOA | P21397 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL392159 | 0.90 | SIGMAR1 (0.52) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| Hydrochloric Acid SCHEMBL9442792 | 0.90 | SIGMAR1 (0.52) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL12040615 | 0.77 | SIGMAR1 (0.50) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL12040642 | 0.77 | SIGMAR1 (0.50) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL11838960 | 0.75 | ALDH1A1 (0.48) | L3MBTL1MAOAMAOB | |
| SCHEMBL31651216 | 0.75 | L3MBTL1 (0.48) | SIGMAR1L3MBTL1MAOAMAOB | |
| SCHEMBL8095284 | 0.74 | SIGMAR1 (0.71) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL1433686 | 0.74 | SIGMAR1 (0.71) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL8085946 | 0.74 | SIGMAR1 (0.71) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 | |
| SCHEMBL6546948 | 0.74 | SIGMAR1 (0.71) | SIGMAR1L3MBTL1MAOAMAPTRXFP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |