SCHEMBL4364053

SCHEMBL4364053

CC(C)=COCCC(C)CCOC=C(C)C

nearest known ligand 0.42

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.42
ALDH1A1 P00352 1/20 0.37
NFE2L2 Q16236 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4366768 0.89 ALOX15 (0.35) ALOX15
SCHEMBL4425841 0.85 CA12 (0.37) ALOX15ALDH1A1
SCHEMBL4368259 0.78
SCHEMBL4437733 0.76 PTPN1 (0.33)
SCHEMBL4368220 0.74 ALDH1A1 (0.30) ALOX15ALDH1A1
SCHEMBL4365140 0.73
SCHEMBL4365827 0.73
SCHEMBL4376188 0.70 CES2 (0.30)
SCHEMBL4365823 0.70 MEN1 (0.33)
SCHEMBL4371579 0.70 CES2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035696-A1 PHOTORESIST COMPOSITION KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed