SCHEMBL436471

SCHEMBL436471

C=CCc1cccc(C#Cc2ccccc2)c1C1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.34
MMP9 P14780 2/20 0.34
MMP1 P03956 1/20 0.34
MAPT P10636 3/20 0.33
KDM4E B2RXH2 3/20 0.33
ALDH1A1 P00352 3/20 0.33
NPC1 O15118 2/20 0.33
MEN1 O00255 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HSD17B10 Q99714 1/20 0.33
GABRA1 P14867 1/20 0.32
GABRB2 P47870 1/20 0.32
DRD2 P14416 1/20 0.32
DRD3 P35462 1/20 0.32
GRM5 P41594 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9493041 0.81 DRD2 (0.36) KMT2AMAPTKDM4EALDH1A1GABRA1
SCHEMBL14692733 0.80 GABRA1 (0.43) KMT2AMAPTKDM4EALDH1A1MEN1
SCHEMBL7141363 0.76 GABRA1 (0.41) KMT2AMAPTKDM4EALDH1A1MEN1
SCHEMBL8837766 0.75 ABCB1 (0.43) KMT2AMAPTKDM4EALDH1A1NPC1
SCHEMBL491175 0.75 GABRA1 (0.46) KMT2AMAPTKDM4EALDH1A1MEN1
SCHEMBL17666848 0.73 GABRA1 (0.47) KMT2AMAPTKDM4EALDH1A1MEN1
SCHEMBL9784205 0.73 GABRA1 (0.40) KMT2AMAPTKDM4EALDH1A1MEN1
SCHEMBL7888463 0.72 CYP1A2 (0.42) KMT2AMAPTKDM4EALDH1A1CYP1A2
SCHEMBL9797619 0.72 ALDH1A1 (0.42) KMT2AMAPTKDM4EALDH1A1GABRA1
SCHEMBL964479 0.71 FFAR1 (0.39) KMT2AMMP9MMP1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101946194-B Retardation plate, method for manufacturing the retardation plate, and liquid crystal display device TOPPAN PRINTING CO LTD 2013-11-13 CN disclosed
US-8488098-B2 Phase-type diffraction device, manufacturing method thereof and image pick-up apparatus TOPPAN PRINTING CO., LTD. (JP) 2013-07-16 US disclosed
CN-101910889-B Phase difference plate, method for manufacturing same, and liquid crystal display device TOPPAN PRINTING CO LTD 2013-03-13 CN disclosed
CN-102124381-B Retardation substrate, method for manufacturing the same, and liquid crystal display device TOPPAN PRINTING CO LTD 2013-01-16 CN disclosed
US-8350998-B2 Retardation substrate, method of manufacturing the same, and liquid crystal display TOPPAN PRINTING CO., LTD. (JP) 2013-01-08 US disclosed
US-8284357-B2 Retardation plate, method for manufacturing the retardation plate, and liquid crystal display TOPPAN PRINTING CO., LTD. (JP) 2012-10-09 US disclosed
CN-101910920-B Retardation plate, semi-transmissive liquid crystal display device, and method for producing retardation plate TOPPAN PRINTING CO LTD 2012-06-20 CN disclosed
US-8101249-B2 Retardation substrate, method of manufacturing the same, and liquid crystal display TOPPAN PRINTING CO., LTD. (JP) 2012-01-24 US disclosed
CN-102317818-A Phase-type diffraction element, manufacturing method thereof, and image pickup apparatus TOPPAN PRINTING CO LTD 2012-01-11 CN disclosed
CN-102308233-A Phase type diffraction element, method for manufacturing the same, and image pickup apparatus TOPPAN PRINTING CO LTD 2012-01-04 CN disclosed
EP-2259129-A1 RETARDATION PLATE, SEMI-TRANSMISSIVE LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING RETARDATION PLATE Toppan Printing Co., Ltd. (JP) 2010-12-08 EP disclosed
US-20100149460-A1 Liquid Crystal Display Device and Method for Manufacturing the Same TOPPAN PRINTING CO., LTD. (JP) 2010-06-17 US disclosed
US-20100060845-A1 RETARDATION SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY TOPPAN PRINTING CO., LTD. (JP) 2010-03-11 US disclosed
EP-2120072-A1 RETARDATION SUBSTRATE, METHOD FOR PRODUCTION THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE Toppan Printing Co., Ltd. (JP) 2009-11-18 EP disclosed
US-20090279042-A1 RETARDATION SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY TOPPAN PRINTING CO., LTD. (JP) 2009-11-12 US disclosed
CN-101542337-A Retardation substrate, method for production thereof, and liquid crystal display device TOPPAN PRINTING CO LTD (JP) 2009-09-23 CN disclosed
US-20090128743-A1 Retardation substrate, method of manufacturing the same, and liquid crystal display TOPPAN PRINTING CO., LTD (JP) 2009-05-21 US disclosed
EP-0930286-B1 LIQUID-CRYSTAL ALKENYLTOLAN DERIVATIVE, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENT CHISSO CORP (JP) 2005-01-12 EP disclosed
US-6333080-B1 HIGH ANISOTROPY, HIGH ELASTIC CONSTANT RATIO, EXCELLENT COMPARABILITY WITH OTHER LIQUID-CRYSTAL COMPOUNDS, AND LOW VISCOSITY AND ARE CHEMICALLY AND PHYSICALLY STABLE CHISSO CORPORATION (JP) 2001-12-25 US disclosed
EP-0930286-A1 LIQUID-CRYSTAL ALKENYLTOLAN DERIVATIVE, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 1999-07-21 EP disclosed