SCHEMBL4375359

SCHEMBL4375359

O=S(=O)(C=Cc1ccc(O)cc1)C=Cc1ccc(O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 4/20 0.54
KDM4E B2RXH2 3/20 0.54
ALDH1A1 P00352 3/20 0.54
MAPT P10636 3/20 0.54
CYP2C9 P11712 3/20 0.54
CA12 O43570 3/20 0.54
CA1 P00915 3/20 0.54
CA2 P00918 3/20 0.54
CA3 P07451 3/20 0.54
CA4 P22748 3/20 0.54
CA6 P23280 3/20 0.54
CA5A P35218 3/20 0.54
CA7 P43166 3/20 0.54
CA9 Q16790 3/20 0.54
CA14 Q9ULX7 3/20 0.54
CA5B Q9Y2D0 3/20 0.54
MAOB P27338 3/20 0.54
TYR P14679 3/20 0.54
AKR1B1 P15121 3/20 0.54
CA13 Q8N1Q1 2/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2298611 0.84 APP (0.52) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL2298614 0.84 APP (0.52) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL10369660 0.82 CA2 (0.50) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL31051124 0.82 APP (0.50) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL10369661 0.82 CA2 (0.50) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL12425743 0.77 PTPN1 (0.71) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL14244758 0.77 PTPN1 (0.71) APPKDM4EALDH1A1MAPTCYP2C9
SCHEMBL29259613 0.76 NFE2L2 (0.50) APPMEN1KMT2APKMPTGS2
SCHEMBL5713492 0.76 CYP19A1 (0.54) APPALDH1A1CYP2C9CA12CA1
SCHEMBL8790770 0.76 LMNA (0.51) ALDH1A1MAPTCA1MEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150185616-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC 2015-07-02 US disclosed
US-20130136897-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC (US) 2013-05-30 US disclosed
US-8383316-B2 Multi-step; reversible; provide exposure quadratically dependant on intensity of light; semiconductors PIXELLIGENT TECHNOLOGIES, LLC (US) 2013-02-26 US disclosed
EP-2047332-A2 RESISTS FOR PHOTOLITHOGRAPHY Pixelligent Technologies LLC, (US) 2009-04-15 EP disclosed
US-20080176166-A1 RESISTS FOR LITHOGRAPHY PIXELLIGENT TECHNOLOGIES, LLC 2008-07-24 US disclosed
WO-2008008275-A2 RESISTS FOR PHOTOLITHOGRAPHY PIXELLIGENT TECHNOLOGIES LLC (US) 2008-01-17 WO disclosed