Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 2/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6889186 | 1.00 | LMNA (0.48) | LMNATP53THRBPPARACHRM1 | |
| SCHEMBL6889182 | 1.00 | LMNA (0.48) | LMNATP53THRBPPARACHRM1 | |
| SCHEMBL10633540 | 0.98 | LMNA (0.46) | LMNATP53THRBPPARACHRM1 | |
| SCHEMBL28938350 | 0.96 | LMNA (0.44) | LMNAPPARA | |
| SCHEMBL29067147 | 0.87 | LMNA (0.37) | LMNA | |
| SCHEMBL27154341 | 0.82 | LMNA (0.48) | LMNATHRB | |
| SCHEMBL8665797 | 0.80 | LMNA (0.43) | LMNATP53THRBPPARACHRM1 | |
| SCHEMBL15137737 | 0.80 | — | — | |
| SCHEMBL142064 | 0.80 | — | — | |
| SCHEMBL3141884 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190079408-A1 | DUAL DEVELOPING METHODS FOR LITHOGRAPHY PATTERNING | GLOBALFOUNDRIES U.S. INC. | 2019-03-14 | — | — | US | claimed |
| WO-2009131692-A1 | SUBSTRATES FOR DELIVERY OF PHYSIOLOGICALLY ACTIVE AGENTS | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA (US) | 2009-10-29 | — | — | WO | claimed |
| US-20260063995-A1 | SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-12372867-B2 | Photoresists comprising multiple acid generator compounds | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-07-29 | — | — | US | disclosed |
| US-20250231481-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-07-17 | — | — | US | disclosed |
| US-20250123568-A1 | COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2025-04-17 | — | — | US | disclosed |
| CN-119828412-A | Composition for removing edge bead, developer composition, and method for forming pattern | 三星SDI株式会社 | 2025-04-15 | — | — | CN | disclosed |
| CN-119775113-A | UV absorbing compounds and photoresist compositions containing the same | 湖北鼎龙芯盛科技有限公司 | 2025-04-08 | — | — | CN | disclosed |
| US-12242193-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2025-03-04 | — | — | US | disclosed |
| CN-119522206-A | Device for preparing electronic grade ethyl lactate and method for preparing electronic grade ethyl lactate by using device | 普利特有限公司 | 2025-02-25 | — | — | CN | disclosed |
| US-12228858-B2 | Coating composition for forming resist underlayer film for EUV lithography process | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2025-02-18 | — | — | US | disclosed |
| US-20120141939-A1 | PHOTOACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2012-06-07 | — | — | US | disclosed |
| EP-2458440-A1 | Photoacid generators | Rohm and Haas Electronic Materials LLC (US) | 2012-05-30 | — | — | EP | disclosed |
| US-20120129105-A1 | PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| EP-2455812-A2 | Photosensitive copolymer and photoresist composition | Rohm and Haas Electronic Materials LLC (US) | 2012-05-23 | — | — | EP | disclosed |
| US-6720463-B1 | REDUCING AN ALKYLHYDROXYESTER WITH EASY TO HANDLE SODIUM BOROHYDRIDE; MAINTAINING OPTICAL ACTIVITY | IHARA CHEMICAL INDUSTRY CO., LTD. (JP) | 2004-04-13 | — | — | US | disclosed |
| EP-1146032-A1 | PROCESS FOR THE PRODUCTION OF ALKANEDIOL DERIVATIVES | IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-4781762-A | ALDEHYDE-RELEASING | HERCULES INCORPORATED (US) | 1988-11-01 | — | — | US | disclosed |
| US-4697025-A | ETHERS WHICH DECOMPOSE TO ALDEHYDES | HERCULES INCORPORATED (US) | 1987-09-29 | — | — | US | disclosed |
| EP-0217581-A1 | Carboxylate salt compound and method for flavouring foodstuffs and tobacco | HERCULES INCORPORATED (US) | 1987-04-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250123568-A1 | COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | EZH2, ELOB, RACK1 | LMNA 3070/4885TP53 4617/4885THRB 2196/4885 |
| US-20120141939-A1 | PHOTOACID GENERATORS | F10, GNG2, H1-0 | LMNA 3191/4885TP53 4312/4885THRB 3971/4885 |
| US-12228858-B2 | Coating composition for forming resist underlayer film for EUV lithography process | ETV6, PRDM9, PARG | LMNA 684/4885TP53 3928/4885THRB 3791/4885 |
| US-20260063995-A1 | SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS | ETV6, RPS4Y1, ETV1 | LMNA 3934/4885TP53 1217/4885THRB 3325/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.