SCHEMBL4381200

SCHEMBL4381200

CC(=O)OCCOC(=O)CCN

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
CHRM5 P08912 2/20 0.46
CHRM1 P11229 2/20 0.46
CHRM3 P20309 2/20 0.46
PGR P06401 1/20 0.46
CHRM2 P08172 1/20 0.46
CHRM4 P08173 1/20 0.46
HTR1A P08908 1/20 0.46
CHRNB2 P17787 1/20 0.46
TBXA2R P21731 1/20 0.46
CHRNB4 P30926 1/20 0.46
CHRNA3 P32297 1/20 0.46
CHRNA7 P36544 1/20 0.46
CHRNA4 P43681 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CHRNA10 Q9GZZ6 1/20 0.46
CHRNA9 Q9UGM1 1/20 0.46
TSHR P16473 1/20 0.46
GALR3 O60755 2/20 0.45
GAA P10253 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7594598 0.88 TDP1 (0.48) ALDH1A1CHRM5CHRM1CHRM3CHRM2
SCHEMBL15635407 0.85 ALDH1A1 (0.54) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL13577868 0.84 CYP1A2 (0.45) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL2568519 0.82 TSHR (0.44) ALDH1A1SMN1; SMN2TSHRGAARAB9A
SCHEMBL23049674 0.81 ALDH1A1 (0.50) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL10523871 0.81 TDP1 (0.43) ALDH1A1SMN1; SMN2TSHRDGKACYP1A2
SCHEMBL17833479 0.81 DGKA (0.64) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL7588536 0.81 TDP1 (0.43) ALDH1A1SMN1; SMN2TSHRDGKACYP1A2
SCHEMBL7600473 0.80
SCHEMBL9270782 0.79 THRB (0.53) ALDH1A1CHRM5CHRM1CHRM3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023141576-A1 COMPOSITIONS AND METHODS FOR DELIVERY OF NUCLEIC ACIDS POSEIDA THERAPEUTICS, INC. (US) 2023-07-27 WO disclosed
US-7629106-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-08 US disclosed
US-20070111140-A1 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 US disclosed
US-20050079446-A1 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050079440-A1 Novel polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed