SCHEMBL4381659

SCHEMBL4381659

C[CH]C1CC(C)(C)C(=O)O1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HTR7 P34969 4/20 0.31
PTPN1 P18031 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20630755 0.78
SCHEMBL3874762 0.72 PTPN1 (0.32) PTPN1
SCHEMBL441723 0.70
SCHEMBL700302 0.69 PTPN1 (0.30) PTPN1
SCHEMBL24312513 0.68
SCHEMBL893868 0.68
SCHEMBL10046445 0.68
SCHEMBL20117319 0.65 HTR7 (0.31) HTR7PTPN1
SCHEMBL576941 0.65 HTR7 (0.43) HTR7PTPN1
SCHEMBL7755872 0.64 HTR7 (0.42) HTR7PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130164695-A1 METHOD FOR FORMING PATTERN JSR CORPORATION (JP) 2013-06-27 US disclosed
EP-2131240-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR Corporation (JP) 2009-12-09 EP disclosed