SCHEMBL440062

SCHEMBL440062

CCC1(OC(C)=O)CCCCC1

nearest known ligand 0.48

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32
KDM4E B2RXH2 3/20 0.30
CYP2C19 P33261 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
CYP19A1 P11511 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14883391 1.00 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10KDM4ECYP2C19
SCHEMBL13649534 1.00 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10KDM4ECYP2C19
SCHEMBL143845 0.98 ALDH1A1 (0.33) ALDH1A1LMNAHSD17B10MEN1KMT2A
SCHEMBL13104282 0.93 ALDH1A1 (0.33) ALDH1A1LMNAHSD17B10
SCHEMBL15492447 0.89
SCHEMBL14990797 0.84 CYP2C19 (0.31) ALDH1A1LMNAKDM4ECYP2C19MEN1
SCHEMBL20484018 0.84 CYP2C19 (0.31) ALDH1A1LMNAKDM4ECYP2C19MEN1
SCHEMBL8978123 0.83 CETP (0.32) ALDH1A1LMNAHSD17B10MEN1KMT2A
SCHEMBL20484020 0.83 CYP2C19 (0.34) ALDH1A1LMNAKDM4ECYP2C19MEN1
SCHEMBL14655770 0.83 KDM4E (0.30) KDM4ECYP2C19MEN1KMT2ACYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1170343-B1 INFRARED SENSITIVE COATING LIQUID ASAHI KASEI CHEMICALS CORP (JP) 2005-11-02 EP claimed
US-6653046-B2 Flexography printing plates; drawing images; using ester solvents ASAHI KASEI KABUSHIKI KAISHA (JP) 2003-11-25 US claimed
US-20020187429-A1 Infrared sensitive coating liquid ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-12-12 US claimed
US-6369279-B1 STYRENE WITH ETHER OR FLUORINE GROUPS FOR POLYMERS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-09 US claimed
EP-1170343-A1 INFRARED SENSITIVE COATING LIQUID Asahi Kasei Kabushiki Kaisha (JP) 2002-01-09 EP claimed
EP-3902878-B1 PHOTOINITIATORS IGM RESINS ITALIA SRL (IT) 2026-05-06 EP disclosed
WO-2024149992-A1 IMAGING COMPOUNDS FOR DETECTING OR IMAGING SENESCENT CELLS UNIVERSITY OF DUNDEE (GB) 2024-07-18 WO disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
WO-2024115760-A1 ESTERS AND ETHERS OF 5-ISOPROPYL-2-METHYLCYCLOHEXAN-1-OL AS FRAGRANCE INGREDIENTS BASF SE (DE) 2024-06-06 WO disclosed
WO-2024100276-A2 SUBSTITUTED 1,3-DIOXOLAN-4-ONES AND 1,3-DIOXAN-4-ONES AS FRAGRANCE INGREDIENTS BASF SE (DE) 2024-05-16 WO disclosed
WO-2024100254-A1 DIMETHYL ACRYLIC ACID-BASED COMPOUNDS AS AROMA INGREDIENTS BASF SE (DE) 2024-05-16 WO disclosed
WO-2024068860-A1 OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS REUTER CHEMISCHE APPARATEBAU E.K. (DE) 2024-04-04 WO disclosed
EP-1170343-A1 INFRARED SENSITIVE COATING LIQUID Asahi Kasei Kabushiki Kaisha (JP) 2002-01-09 EP disclosed
US-6333436-B1 Styrene derivatives SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-12-25 US disclosed
US-20010051741-A1 Novel ester compounds having alicyclic structure and method for preparing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-12-13 US disclosed
US-20010051742-A1 Novel ester compounds having alicyclic structure and method for preparing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-12-13 US disclosed
US-20010038971-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-08 US disclosed
EP-1149826-A2 Ester compounds having alicyclic structure, and methods for preparing the same Shin-Etsu Chemical Co., Ltd. (JP) 2001-10-31 EP disclosed
US-20010033994-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 ALDH1A1 492/4885LMNA 4690/4885HSD17B10 729/4885
US-20010051742-A1 Novel ester compounds having alicyclic structure and method for preparing same ARCN1, ECH1, GAR1 ALDH1A1 460/4885LMNA 218/4885HSD17B10 960/4885
US-20010051741-A1 Novel ester compounds having alicyclic structure and method for preparing same ARCN1, ECH1, ASIC1 ALDH1A1 421/4885LMNA 228/4885HSD17B10 1786/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.