SCHEMBL4403306

SCHEMBL4403306

COc1ccc2ccc3c(c2c1)CC1C2C=CC(C2)C31

nearest known ligand 0.40

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.40
GAA P10253 1/20 0.40
DPP4 P27487 13/20 0.39
MTNR1B P49286 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408096 0.91 DPP4 (0.39) MTNR1AGAADPP4MTNR1B
SCHEMBL4401575 0.85 MTNR1A (0.37) MTNR1AGAADPP4MTNR1B
SCHEMBL4402522 0.79 CHRNB2 (0.46) GAA
SCHEMBL4405529 0.79 MTNR1A (0.45) MTNR1AGAAMTNR1B
SCHEMBL4405540 0.77 DPP4 (0.37) MTNR1AGAADPP4MTNR1B
SCHEMBL4402560 0.73 HTR2A (0.45) MTNR1AGAAMTNR1B
SCHEMBL4405547 0.69 MTNR1A (0.42) MTNR1AGAADPP4MTNR1B
SCHEMBL4405582 0.68 MTNR1A (0.39) MTNR1AGAADPP4MTNR1B
SCHEMBL4402553 0.68 MTNR1A (0.39) MTNR1AGAAMTNR1B
SCHEMBL4402559 0.66 MTNR1A (0.43) MTNR1AMTNR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed