Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.33 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | LIPA | P38571 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13100636 | 0.86 | — | — | |
| SCHEMBL804962 | 0.80 | — | — | |
| SCHEMBL65094 | 0.80 | — | — | |
| SCHEMBL19625940 | 0.79 | — | — | |
| SCHEMBL3234183 | 0.79 | — | — | |
| SCHEMBL3234175 | 0.79 | — | — | |
| SCHEMBL503730 | 0.77 | LIPA (0.39) | MAPTHTTMEN1KMT2AAPOBEC3A | |
| SCHEMBL3158779 | 0.73 | — | — | |
| SCHEMBL19428087 | 0.73 | — | — | |
| SCHEMBL2863383 | 0.73 | MAPT (0.37) | MAPTHTTMEN1KMT2AAPOBEC3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858670-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7858670-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20100026771-A1 | INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20100026771-A1 | INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-2149457-A2 | Inkjet recording method, inkjet recording system, and printed material | Fujifilm Corporation (JP) | 2010-02-03 | — | — | EP | disclosed |
| EP-1146033-B1 | Fragrance precursors | GIVAUDAN SA (CH) | 2009-12-23 | — | — | EP | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-7375145-B2 | capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-05-20 | — | — | US | disclosed |
| US-7375145-B2 | capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1528088-B1 | Inkjet ink | TOSHIBA TEC KK (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-20070270520-A1 | Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | RISO TECHNOLOGIES CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070270520-A1 | Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | RISO TECHNOLOGIES CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070185224-A1 | PHOTOSENSITIVE INKJET INK | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070185224-A1 | PHOTOSENSITIVE INKJET INK | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070101898-A1 | Inkjet ink | AKIYAMA RYOZO | 2007-05-10 | — | — | US | disclosed |
| US-20070101898-A1 | Inkjet ink | AKIYAMA RYOZO | 2007-05-10 | — | — | US | disclosed |
| US-6492563-B2 | PROVIDES NON-VOLATILE PRECURSORS FOR VOLATILE FRAGRANT ESTERS FOR USE IN DETERGENT, A FABRIC SOFTENER, A WINDOW CLEANER, A HARD SURFACE CLEANER, AN ALL PURPOSE CLEANER, A FURNITURE POLISH, A SHAMPOO, A CONDITIONER, AN HAIRSPRAY, A COSMETIC | GIVAUDAN SA (CH) | 2002-12-10 | — | — | US | disclosed |
| US-20020077508-A1 | Fragrance precursors | GIVAUDAN SA (CH) | 2002-06-20 | — | — | US | disclosed |
| EP-1146033-A2 | Fragrance precursors | Givaudan SA (CH) | 2001-10-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020077508-A1 | Fragrance precursors | ADH5, FAAH, CBR3 | MAPT 4053/4885HTT 4313/4885MEN1 2890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.