Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | HRH1 | P35367 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | SIRT2 | Q8IXJ6 | 2/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HTR2C | P28335 | 5/20 | 0.32 |
| ▸ | MTNR1A | P48039 | 5/20 | 0.32 |
| ▸ | MTNR1B | P49286 | 5/20 | 0.32 |
| ▸ | RAD52 | P43351 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4402553 | 0.92 | MTNR1A (0.39) | GAAHTR2CMTNR1AMTNR1BALDH1A1 | |
| SCHEMBL4402560 | 0.85 | HTR2A (0.45) | HTR2AHRH1GAASLC6A2SLC6A4 | |
| SCHEMBL4405540 | 0.81 | DPP4 (0.37) | HTR2AHRH1GAASLC6A2SLC6A4 | |
| SCHEMBL4401569 | 0.78 | CHRNB2 (0.42) | HTR2AGAAHTR2CALDH1A1 | |
| SCHEMBL4405529 | 0.77 | MTNR1A (0.45) | GAAHTR2CMTNR1AMTNR1BALDH1A1 | |
| SCHEMBL4401574 | 0.76 | CHRNB2 (0.40) | HTR2AGAAHTR2CALDH1A1 | |
| SCHEMBL4408136 | 0.75 | HTR2A (0.38) | HTR2AHRH1GAAHTR2CMTNR1A | |
| SCHEMBL4401575 | 0.75 | MTNR1A (0.37) | GAAMTNR1AMTNR1B | |
| SCHEMBL4408092 | 0.74 | MTNR1A (0.35) | MTNR1AMTNR1B | |
| SCHEMBL14980969 | 0.74 | POLB (0.36) | CYP2A6ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877422-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120108071-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |