SCHEMBL4408092

SCHEMBL4408092

COc1cccc2ccc3c(c12)C1C(C3)C2CC1C1C3C=CC(C3)C21

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 9/20 0.35
MTNR1B P49286 9/20 0.35
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408093 0.85 MEN1 (0.39) MTNR1AMTNR1BMEN1KMT2A
SCHEMBL4448561 0.79
SCHEMBL4403414 0.76 HTR2A (0.34) MEN1KMT2A
SCHEMBL4405533 0.74 HTR2A (0.42) MTNR1AMTNR1B
SCHEMBL4408082 0.73 CYP19A1 (0.40) MEN1KMT2A
SCHEMBL4401578 0.73 HTR2A (0.36) MTNR1AMTNR1BMEN1KMT2A
SCHEMBL4402533 0.71 CYP19A1 (0.39) MEN1KMT2A
SCHEMBL4403405 0.69 MEN1 (0.39) MTNR1AMTNR1BMEN1KMT2A
SCHEMBL4405528 0.68
SCHEMBL4401574 0.66 CHRNB2 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed