SCHEMBL4408093

SCHEMBL4408093

COc1cccc2ccc3c(c12)C1C2C=CC(C2)C1C3

nearest known ligand 0.40

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
MTNR1B P49286 10/20 0.37
MTNR1A P48039 9/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4408092 0.85 MTNR1A (0.35) MEN1KMT2AMTNR1BMTNR1A
SCHEMBL4403405 0.81 MEN1 (0.39) MEN1KMT2AMTNR1BMTNR1A
SCHEMBL4448555 0.77
SCHEMBL4405529 0.73 MTNR1A (0.45) MTNR1BMTNR1A
SCHEMBL4402560 0.72 HTR2A (0.45) MTNR1BMTNR1A
SCHEMBL4401578 0.71 HTR2A (0.36) MEN1KMT2AMTNR1BMTNR1A
SCHEMBL4403414 0.70 HTR2A (0.34) MEN1KMT2A
SCHEMBL4403294 0.70 CYP19A1 (0.44) MEN1KMT2A
SCHEMBL4403313 0.68 GAA (0.43) MEN1KMT2AMTNR1BMTNR1A
SCHEMBL443530 0.64 CA12 (0.55) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed