SCHEMBL4403405

SCHEMBL4403405

COc1cccc2ccc3c(c12)CC1C2C=CC(C2)C31

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
ALDH1A1 P00352 2/20 0.35
GAA P10253 2/20 0.35
KDM4E B2RXH2 1/20 0.35
MAPT P10636 1/20 0.35
HPGD P15428 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP19A1 P11511 1/20 0.34
PPARG P37231 2/20 0.33
MCHR1 Q99705 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
HTR2B P41595 1/20 0.33
RXRA P19793 1/20 0.33
PPARD Q03181 1/20 0.33
PPARA Q07869 1/20 0.33
MAPK1 P28482 1/20 0.33
ACHE P22303 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4403294 0.85 CYP19A1 (0.44) MEN1KMT2AALDH1A1GAACYP19A1
SCHEMBL4408093 0.81 MEN1 (0.39) MEN1KMT2AMTNR1AMTNR1B
SCHEMBL4443404 0.76
SCHEMBL4408096 0.73 DPP4 (0.39) ALDH1A1GAAHPGDHTR2AMTNR1A
SCHEMBL1730421 0.71 KDM4E (0.35) MEN1KMT2AALDH1A1KDM4EHTR2A
SCHEMBL4401578 0.69 HTR2A (0.36) MEN1KMT2AALDH1A1GAAKDM4E
SCHEMBL4408082 0.69 CYP19A1 (0.40) MEN1KMT2ACYP19A1HTR2AACHE
SCHEMBL4408092 0.69 MTNR1A (0.35) MEN1KMT2AMTNR1AMTNR1B
SCHEMBL4403414 0.68 HTR2A (0.34) MEN1KMT2AALDH1A1GAAKDM4E
SCHEMBL1730486 0.68 TRPM5 (0.35) MEN1KMT2AALDH1A1HTTHTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed