SCHEMBL4403294

SCHEMBL4403294

COc1cccc2c1CC1C3C=CC(C3)C21

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
CYP11B2 P19099 1/20 0.40
ADRA1A P35348 1/20 0.39
ACHE P22303 1/20 0.39
DRD2 P14416 3/20 0.37
DRD3 P35462 3/20 0.37
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
SLC6A3 Q01959 1/20 0.37
HTR2A P28223 1/20 0.37
CHRM2 P08172 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
ALDH1A1 P00352 1/20 0.36
MAPK1 P28482 1/20 0.36
SIGMAR1 Q99720 1/20 0.36
DRD4 P21917 2/20 0.35
GAA P10253 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4403405 0.85 MEN1 (0.39) CYP19A1MEN1KMT2ACYP11B2ACHE
SCHEMBL4408082 0.83 CYP19A1 (0.40) CYP19A1MEN1KMT2ACYP11B2ADRA1A
SCHEMBL4402533 0.81 CYP19A1 (0.39) CYP19A1MEN1KMT2ACYP11B2ADRA1A
SCHEMBL1730421 0.80 KDM4E (0.35) MEN1KMT2AADRA1AACHESLC6A2
SCHEMBL1730486 0.76 TRPM5 (0.35) MEN1KMT2AHTR2AALDH1A1
SCHEMBL10068328 0.73 MEN1 (0.31) MEN1KMT2A
SCHEMBL4408096 0.72 DPP4 (0.39) HTR2AALDH1A1GAA
SCHEMBL4402522 0.70 CHRNB2 (0.46) CYP19A1DRD2DRD3HTR2AALDH1A1
SCHEMBL4408093 0.70 MEN1 (0.39) MEN1KMT2A
SCHEMBL5997657 0.69 ACHE (0.41) CYP19A1ADRA1AACHEDRD2DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed