SCHEMBL4408121

SCHEMBL4408121

COc1cccc2ccc3c(c12)CCC=C3

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.37
RXRA P19793 1/20 0.37
PPARD Q03181 1/20 0.37
PPARA Q07869 1/20 0.37
ACHE P22303 2/20 0.36
HTR2C P28335 2/20 0.35
MCHR1 Q99705 1/20 0.34
KDM4E B2RXH2 3/20 0.34
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
KMT2A Q03164 1/20 0.34
ATM Q13315 1/20 0.34
ALDH1A1 P00352 2/20 0.33
HPGD P15428 2/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP2A6 P11509 1/20 0.33
MTNR1A P48039 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4405532 0.84 PPARG (0.38) PPARGRXRAPPARDPPARAACHE
SCHEMBL3319373 0.82 DRD2 (0.40) ACHENOTUM
SCHEMBL30485650 0.82 DRD2 (0.40) ACHENOTUM
SCHEMBL10067903 0.73 CYP2A6 (0.36) MEN1LMNAKMT2ATDP1CYP2A6
SCHEMBL27914001 0.72 ALDH1A1 (0.45) ACHEKDM4EKMT2AALDH1A1HPGD
SCHEMBL4403311 0.70 PPARG (0.39) PPARGRXRAPPARDPPARAACHE
SCHEMBL17573430 0.70 MAPT (0.49) KDM4EMEN1LMNAKMT2AALDH1A1
SCHEMBL443530 0.70 CA12 (0.55) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL29709902 0.70 CA12 (0.55) PPARGRXRAPPARDPPARAMCHR1
SCHEMBL8766176 0.70 SLC6A2 (0.43) ACHEKDM4ELMNAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed