SCHEMBL441658

SCHEMBL441658

CCOC(CN)C(N)(OCC)OCC

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.32
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17530090 0.84 THRB (0.33) THRBLMNA
SCHEMBL16937409 0.80 THRB (0.31) THRB
Hydrochloric Acid SCHEMBL22716640 0.78
SCHEMBL248942 0.76 THRB (0.31) THRB
SCHEMBL18062106 0.71 THRB (0.35) THRBLMNA
SCHEMBL5911035 0.71 LMNA (0.39) THRBLMNA
SCHEMBL12453330 0.71 THRB (0.35) THRBLMNA
SCHEMBL6326331 0.70 THRB (0.33) THRBLMNA
SCHEMBL28183525 0.67 THRB (0.31) THRB
SCHEMBL22117629 0.65 OPRM1 (0.31) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120021127-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND PROCESS FOR FORMING SILICON-CONTAINING THIN FILM USING SAME ADEKA CORPORATION (JP) 2012-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120021127-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND PROCESS FOR FORMING SILICON-CONTAINING THIN FILM USING SAME GRIA4, GRIN2C, NR1H3 THRB 3215/4885LMNA 3773/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.